New route for selective etching in remote plasma source: Application to the fabrication of horizontal stacked Si nanowires for gate all around devices

2019 ◽  
Vol 37 (4) ◽  
pp. 040601 ◽  
Author(s):  
Erwine Pargon ◽  
Camille Petit-Etienne ◽  
Laurène Youssef ◽  
Gaspard Thomachot ◽  
Sylvain David
Keyword(s):  
Plasma Source ◽  
Selective Etching ◽  
Si Nanowires ◽  
Remote Plasma

Plasma density measurement and downstream etching of silicon and silicon oxide in Ar/NF3 mixture remote plasma source

2019 ◽  
Vol 21 (6) ◽  
pp. 064007
Author(s):  
H J YEOM ◽  
D H CHOI ◽  
Y S LEE ◽  
J H KIM ◽  
D J SEONG ◽  
...  
Keyword(s):  
Plasma Density ◽  
Silicon Oxide ◽  
Density Measurement ◽  
Plasma Source ◽  
Remote Plasma

scholarly journals Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes

2020 ◽  
Vol 38 (2) ◽  
pp. 023007 ◽  
Author(s):  
Vladimir Volynets ◽  
Yuri Barsukov ◽  
Gonjun Kim ◽  
Ji-Eun Jung ◽  
Sang Ki Nam ◽  
...  
Keyword(s):  
Plasma Source ◽  
Remote Plasma ◽  
Sio2 Etching

Production and transport chemistry of atomic fluorine in remote plasma source and cylindrical reaction chamber

2007 ◽  
Vol 40 (17) ◽  
pp. 5140-5154 ◽  
Author(s):  
S P Gangoli ◽  
A D Johnson ◽  
A A Fridman ◽  
R V Pearce ◽  
A F Gutsol ◽  
...  
Keyword(s):  
Plasma Source ◽  
Reaction Chamber ◽  
Remote Plasma ◽  
Atomic Fluorine

Optimizing remote plasma sources for selective etching

2016 ◽  
Author(s):  
Shuo Huang ◽  
Mark J. Kushner ◽  
Vladimir Volynets ◽  
Sangheon Lee ◽  
In-Cheol Song ◽  
...  
Keyword(s):  
Selective Etching ◽  
Remote Plasma ◽  
Plasma Sources
Sign in / Sign up

Export Citation Format

Share Document