scholarly journals Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes

2020 ◽  
Vol 38 (2) ◽  
pp. 023007 ◽  
Author(s):  
Vladimir Volynets ◽  
Yuri Barsukov ◽  
Gonjun Kim ◽  
Ji-Eun Jung ◽  
Sang Ki Nam ◽  
...  
Keyword(s):  
Plasma Source ◽  
Remote Plasma ◽  
Sio2 Etching

Ion attachment mass spectrometry of nonequilibrium atmospheric-pressure pulsed remote plasma for SiO2 etching

2006 ◽  
Vol 100 (9) ◽  
pp. 093304 ◽  
Author(s):  
Masahiro Iwasaki ◽  
Masafumi Ito ◽  
Tsuyoshi Uehara ◽  
Megumi Nakamura ◽  
Masaru Hori
Keyword(s):  
Mass Spectrometry ◽  
Atmospheric Pressure ◽  
Remote Plasma ◽  
Ion Attachment ◽  
Sio2 Etching

Plasma density measurement and downstream etching of silicon and silicon oxide in Ar/NF3 mixture remote plasma source

2019 ◽  
Vol 21 (6) ◽  
pp. 064007
Author(s):  
H J YEOM ◽  
D H CHOI ◽  
Y S LEE ◽  
J H KIM ◽  
D J SEONG ◽  
...  
Keyword(s):  
Plasma Density ◽  
Silicon Oxide ◽  
Density Measurement ◽  
Plasma Source ◽  
Remote Plasma

scholarly journals Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism

2020 ◽  
Vol 38 (2) ◽  
pp. 023008 ◽  
Author(s):  
Ji-Eun Jung ◽  
Yuri Barsukov ◽  
Vladimir Volynets ◽  
Gonjun Kim ◽  
Sang Ki Nam ◽  
...  
Keyword(s):  
Reaction Mechanism ◽  
Surface Reaction ◽  
Remote Plasma ◽  
Surface Reaction Mechanism ◽  
Sio2 Etching

Production and transport chemistry of atomic fluorine in remote plasma source and cylindrical reaction chamber

2007 ◽  
Vol 40 (17) ◽  
pp. 5140-5154 ◽  
Author(s):  
S P Gangoli ◽  
A D Johnson ◽  
A A Fridman ◽  
R V Pearce ◽  
A F Gutsol ◽  
...  
Keyword(s):  
Plasma Source ◽  
Reaction Chamber ◽  
Remote Plasma ◽  
Atomic Fluorine

scholarly journals Innovative remote plasma source for atomic layer deposition for GaN devices

2021 ◽  
Vol 39 (6) ◽  
pp. 062403
Author(s):  
Harm C. M. Knoops ◽  
Karsten Arts ◽  
Jan W. Buiter ◽  
Luca Matteo Martini ◽  
Richard Engeln ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Plasma Source ◽  
Remote Plasma ◽  
Layer Deposition
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