Remote plasma atomic layer deposition of silicon nitride with bis(dimethylaminomethyl-silyl)trimethylsilyl amine and N2 plasma for gate spacer

2018 ◽  
Vol 36 (3) ◽  
pp. 031514 ◽  
Author(s):  
Woochool Jang ◽  
Hyunjung Kim ◽  
Youngkyun Kweon ◽  
Chanwon Jung ◽  
Haewon Cho ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition ◽  
N2 Plasma

Temperature dependence of silicon nitride deposited by remote plasma atomic layer deposition

2014 ◽  
Vol 211 (9) ◽  
pp. 2166-2171 ◽  
Author(s):  
Woochool Jang ◽  
Heeyoung Jeon ◽  
Chunho Kang ◽  
Hyoseok Song ◽  
Jingyu Park ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Temperature Dependence ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition

Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2 Plasma on Planar and 3D Substrate Topographies

2017 ◽  
Vol 9 (2) ◽  
pp. 1858-1869 ◽  
Author(s):  
Tahsin Faraz ◽  
Maarten van Drunen ◽  
Harm C. M. Knoops ◽  
Anupama Mallikarjunan ◽  
Iain Buchanan ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Wet Etch ◽  
N2 Plasma

Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma

2015 ◽  
Vol 7 (35) ◽  
pp. 19857-19862 ◽  
Author(s):  
Harm C. M. Knoops ◽  
Eline M. J. Braeken ◽  
Koen de Peuter ◽  
Stephen E. Potts ◽  
Suvi Haukka ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
N2 Plasma
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