scholarly journals Electron beam lithography patterned hydrogen silsesquioxane resist as a mandrel for self-aligned double patterning application

2016 ◽  
Vol 34 (6) ◽  
pp. 061601 ◽  
Author(s):  
Vishal U. Desai ◽  
John G. Hartley ◽  
Nathaniel C. Cady
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Hydrogen Silsesquioxane ◽  
Double Patterning

A master-mold fabrication by electron beam lithography followed by nanoimprinting and self-aligned double patterning

2014 ◽  
Vol 53 (6S) ◽  
pp. 06JK05 ◽  
Author(s):  
Tsuyoshi Watanabe ◽  
Kouta Suzuki ◽  
Hiromasa Iyama ◽  
Takeshi Kagatsume ◽  
Shuji Kishimoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Master Mold ◽  
Mold Fabrication ◽  
Double Patterning

Effect of Salty Development on Forming HSQ Resist Nanodot Arrays with a Pitch of 15×15 nm2 by 30-keV Electron Beam Lithography

2013 ◽  
Vol 534 ◽  
pp. 113-117
Author(s):  
Takuya Komori ◽  
Hui Zhang ◽  
Takashi Akahane ◽  
Zulfakri bin Mohamad ◽  
You Yin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Ammonium Hydroxide ◽  
Hydrogen Silsesquioxane ◽  
Ultrahigh Resolution ◽  
Patterned Media ◽  
Tetramethyl Ammonium ◽  
Tetramethyl Ammonium Hydroxide ◽  
Nanodot Arrays

We investigated the effect of ultrahigh-resolution salty (NaCl contained) development of hydrogen silsesquioxane (HSQ) resist on forming fine dot arrays with a pitch of 15×15 nm2 by 30-keV electron beam lithography for patterned media. The optimized concentration of resist developers was determined to fabricate most packed pattern. We found that increasing the concentration of NaCl into tetramethyl ammonium hydroxide (TMAH) could greatly improve the resist contrast (γ-value) of HSQ. And by using 2.3 wt% TMAH/4 wt% NaCl developer, we demonstrated 15×15 nm2 pitched (3 Tbit/in.2) HSQ resist dot arrays with a dot size of < 10 nm.

Low-energy electron-beam lithography of hydrogen silsesquioxane

2006 ◽  
Vol 83 (4-9) ◽  
pp. 788-791 ◽  
Author(s):  
Haifang Yang ◽  
Aizi Jin ◽  
Qiang Luo ◽  
Changzhi Gu ◽  
Zheng Cui ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Energy ◽  
Energy Electron ◽  
Hydrogen Silsesquioxane ◽  
Low Energy Electron
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