Polymethyl methacrylate/hydrogen silsesquioxane bilayer resist electron beam lithography process for etching 25 nm wide magnetic wires
2014 ◽
Vol 32
(2)
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pp. 021601
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2012 ◽
Vol 98
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pp. 386-390
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1998 ◽
Vol 16
(6)
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pp. 3158
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2008 ◽
Vol 26
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pp. 2049-2053
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2004 ◽
Vol 73-74
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pp. 662-665
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2017 ◽
Vol 35
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pp. 041602
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2000 ◽
Vol 18
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pp. 681-684
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Keyword(s):
2002 ◽
Vol 41
(Part 1, No. 6B)
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pp. 4122-4126
2011 ◽
Vol 88
(8)
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pp. 2338-2341
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