Active-matrix nanocrystalline Si electron emitter array with a function of electronic aberration correction for massively parallel electron beam direct-write lithography: Electron emission and pattern transfer characteristics

2013 ◽  
Vol 31 (6) ◽  
pp. 06F703 ◽  
Author(s):  
Naokatsu Ikegami ◽  
Nobuyoshi Koshida ◽  
Akira Kojima ◽  
Hideyuki Ohyi ◽  
Takashi Yoshida ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Emission ◽  
Massively Parallel ◽  
Pattern Transfer ◽  
Aberration Correction ◽  
Direct Write ◽  
Active Matrix ◽  
Electron Emitter ◽  
Emitter Array ◽  
Nanocrystalline Si

Active-matrix nc-Si electron emitter array for massively parallel direct-write electron-beam system

2012 ◽  
Author(s):  
N. Ikegami ◽  
T. Yoshida ◽  
A. Kojima ◽  
H. Ohyi ◽  
N. Koshida ◽  
...  
Keyword(s):  
Electron Beam ◽  
Massively Parallel ◽  
Direct Write ◽  
Active Matrix ◽  
Electron Emitter ◽  
Beam System ◽  
Emitter Array

Fabrication of Pierce-Type Nanocrystalline Si Electron-Emitter Array for Massively Parallel Electron Beam Lithography

2014 ◽  
Vol 134 (6) ◽  
pp. 146-153 ◽  
Author(s):  
Hitoshi Nishino ◽  
Shinya Yoshida ◽  
Akira Kojima ◽  
Nokatsu Ikegami ◽  
Shuji Tanaka ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Massively Parallel ◽  
Electron Emitter ◽  
Emitter Array ◽  
Nanocrystalline Si

Development of maskless electron-beam lithography using nc-Si electron-emitter array

2013 ◽  
Author(s):  
A. Kojima ◽  
N. Ikegami ◽  
T. Yoshida ◽  
H. Miyaguchi ◽  
M. Muroyama ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Electron Emitter ◽  
Emitter Array
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