Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors

2013 ◽  
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pp. 031509 ◽  
Author(s):  
Rohan P. Chaukulkar ◽  
Sumit Agarwal
2014 ◽  
Vol 32 (1) ◽  
pp. 01A114 ◽  
Author(s):  
Virginia R. Anderson ◽  
Andrew S. Cavanagh ◽  
Aziz I. Abdulagatov ◽  
Zachary M. Gibbs ◽  
Steven M. George

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Vol 26 (2) ◽  
pp. 024003 ◽  
Author(s):  
Stephan Ratzsch ◽  
Ernst-Bernhard Kley ◽  
Andreas Tünnermann ◽  
Adriana Szeghalmi

Nanomaterials ◽  
2018 ◽  
Vol 8 (2) ◽  
pp. 128 ◽  
Author(s):  
Carol López de Dicastillo ◽  
Cristian Patiño ◽  
María Galotto ◽  
Juan Palma ◽  
Daniela Alburquenque ◽  
...  

2017 ◽  
Vol 54 (2) ◽  
pp. 137-140 ◽  
Author(s):  
Hae Ryul Ok ◽  
Bo Kyung Lee ◽  
Hye Jin Bae ◽  
Hyug Jong Kim ◽  
Byung Ho Choi

2019 ◽  
Vol 21 (3) ◽  
pp. 1393-1398 ◽  
Author(s):  
Robert H. Temperton ◽  
Andrew Gibson ◽  
James N. O'Shea

Ultra-thin aluminium oxide was grown on a rutile titanium dioxide surface by atomic layer deposition using trimethylaluminium and water precursors. XPS measurements were made during the growth process at near-ambient pressures.


AIP Advances ◽  
2019 ◽  
Vol 9 (3) ◽  
pp. 035333 ◽  
Author(s):  
Heungseop Song ◽  
Donghyuk Shin ◽  
Ji-eun Jeong ◽  
Heungsoo Park ◽  
Dae-Hong Ko

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