Atomic layer deposition of titanium dioxide using titanium tetrachloride and titanium tetraisopropoxide as precursors
2013 ◽
Vol 31
(3)
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pp. 031509
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2014 ◽
Vol 32
(1)
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pp. 01A114
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2016 ◽
Vol 3
(21)
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pp. 1600369
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2010 ◽
Vol 4
(3)
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pp. 379-383
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2017 ◽
Vol 54
(2)
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pp. 137-140
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2019 ◽
Vol 21
(3)
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pp. 1393-1398
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