scholarly journals In situ XPS analysis of the atomic layer deposition of aluminium oxide on titanium dioxide

2019 ◽  
Vol 21 (3) ◽  
pp. 1393-1398 ◽  
Author(s):  
Robert H. Temperton ◽  
Andrew Gibson ◽  
James N. O'Shea
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Growth Process ◽  
Aluminium Oxide ◽  
Atomic Layer ◽  
Xps Analysis ◽  
Layer Deposition ◽  
Titanium Dioxide Surface ◽  
Rutile Titanium Dioxide

Ultra-thin aluminium oxide was grown on a rutile titanium dioxide surface by atomic layer deposition using trimethylaluminium and water precursors. XPS measurements were made during the growth process at near-ambient pressures.

scholarly journals Understanding KOtBu in atomic layer deposition – in situ mechanistic studies of the KNbO3 growth process

2020 ◽  
Vol 49 (38) ◽  
pp. 13233-13242 ◽  
Author(s):  
Henrik H. Sønsteby ◽  
Veronica A.-L. K. Killi ◽  
Thomas A. Storaas ◽  
Devika Choudhury ◽  
Jeffrey W. Elam ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Alkali Metal ◽  
Growth Process ◽  
Atomic Layer ◽  
Mechanistic Studies ◽  
Layer Deposition ◽  
Ft Ir

Providing a deeper understanding of alkali metal-containing ternary processes in ALD by in situ FT-IR and QCM mechanistic studies.

Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

2000 ◽  
Vol 161 (3-4) ◽  
pp. 385-395 ◽  
Author(s):  
Jaan Aarik ◽  
Aleks Aidla ◽  
Teet Uustare ◽  
Mikko Ritala ◽  
Markku Leskelä
Keyword(s):  
Titanium Dioxide ◽  
Atomic Layer Deposition ◽  
Growth Process ◽  
Atomic Layer ◽  
Titanium Isopropoxide ◽  
Layer Deposition
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