Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography

Sangsul Lee; Inhwan Lee; Jong Gul Doh; Jae Uk Lee; Seongchul Hong; Jinho Ahn

doi:10.1116/1.4793298

Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.4793298 ◽

2013 ◽

Vol 31 (2) ◽

pp. 021606 ◽

Cited By ~ 7

Author(s):

Sangsul Lee ◽

Inhwan Lee ◽

Jong Gul Doh ◽

Jae Uk Lee ◽

Seongchul Hong ◽

...

Keyword(s):

Phase Shift ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Imaging Properties

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Demonstration of phase-shift masks for extreme-ultraviolet lithography

10.1117/12.652212 ◽

2006 ◽

Cited By ~ 5

Author(s):

Bruno La Fontaine ◽

Adam R. Pawloski ◽

Obert Wood ◽

Yunfei Deng ◽

Harry J. Levinson ◽

...

Keyword(s):

Phase Shift ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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Design of Phase-Shift Masks in Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.2639 ◽

2003 ◽

Vol 42 (Part 1, No. 5A) ◽

pp. 2639-2648 ◽

Cited By ~ 2

Author(s):

Minoru Sugawara ◽

Akira Chiba ◽

Iwao Nishiyama

Keyword(s):

Phase Shift ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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Effect of Attenuated Phase Shift Mask Structure on Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics ◽

10.1143/jjap.48.06fa06 ◽

2009 ◽

Vol 48 (6) ◽

pp. 06FA06 ◽

Cited By ~ 3

Author(s):

Hyun-Duck Shin ◽

Chang Young Jeoung ◽

Tae Geun Kim ◽

Sangsul Lee ◽

In-Sung Park ◽

...

Keyword(s):

Phase Shift ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Phase Shift Mask

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Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP)

Thin Solid Films ◽

10.1016/j.tsf.2009.01.119 ◽

2009 ◽

Vol 517 (14) ◽

pp. 3938-3941

Author(s):

H.Y. Jung ◽

Y.R. Park ◽

H.J. Lee ◽

N.-E. Lee ◽

C.Y. Jeong ◽

...

Keyword(s):

Phase Shift ◽

Extreme Ultraviolet ◽

Dry Etching ◽

Extreme Ultraviolet Lithography ◽

Inductively Coupled Plasmas ◽

Ultraviolet Lithography ◽

Inductively Coupled ◽

Coupled Plasmas ◽

Phase Shift Mask ◽

Alternating Phase Shift Mask

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Sub-Resolution Assist Feature in Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography

Nanoscience and Nanotechnology Letters ◽

10.1166/nnl.2016.2263 ◽

2016 ◽

Vol 8 (9) ◽

pp. 739-743

Author(s):

Jung Sik Kim ◽

Seongchul Hong ◽

Yong Ju Jang ◽

Jinho Ahn

Keyword(s):

Phase Shift ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Phase Shift Mask

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Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials

10.1117/12.535503 ◽

2004 ◽

Cited By ~ 5

Author(s):

Sang-In Han ◽

Eric Weisbrod ◽

James R. Wasson ◽

Rich Gregory ◽

Qianghua Xie ◽

...

Keyword(s):

Phase Shift ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3253532 ◽

2009 ◽

Vol 27 (6) ◽

pp. 2361 ◽

Cited By ~ 6

Author(s):

H. Y. Jung ◽

Y. R. Park ◽

H. J. Lee ◽

N.-E. Lee ◽

C. Y. Jeong ◽

...

Keyword(s):

Phase Shift ◽

Extreme Ultraviolet ◽

Dry Etching ◽

Extreme Ultraviolet Lithography ◽

Inductively Coupled Plasmas ◽

Ultraviolet Lithography ◽

Inductively Coupled ◽

Coupled Plasmas ◽

Phase Shift Mask

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Stochastic Patterning Simulation Using Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography

Applied Physics Express ◽

10.7567/apex.6.096501 ◽

2013 ◽

Vol 6 (9) ◽

pp. 096501 ◽

Cited By ~ 1

Author(s):

Seongchul Hong ◽

Seejun Jeong ◽

Jae Uk Lee ◽

Seung Min Lee ◽

Jinho Ahn

Keyword(s):

Phase Shift ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Phase Shift Mask

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Improvement of imaging properties by optimizing the capping structure in extreme ultraviolet lithography

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3246358 ◽

2009 ◽

Vol 27 (6) ◽

pp. 2922 ◽

Cited By ~ 2

Author(s):

Chang Young Jeong ◽

Sangsul Lee ◽

Hyun-Duck Shin ◽

Tae Geun Kim ◽

Jinho Ahn

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Imaging Properties

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Attenuated phase-shift mask for mitigation of photon shot noise effect in contact hole pattern for extreme ultraviolet lithography

Applied Physics Express ◽

10.7567/apex.7.096502 ◽

2014 ◽

Vol 7 (9) ◽

pp. 096502 ◽

Cited By ~ 1

Author(s):

Jung Sik Kim ◽

Seongchul Hong ◽

Jae Uk Lee ◽

Seung Min Lee ◽

Jinho Ahn

Keyword(s):

Phase Shift ◽

Shot Noise ◽

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Noise Effect ◽

Ultraviolet Lithography ◽

Phase Shift Mask

Download Full-text