scholarly journals Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing

2013 ◽  
Vol 31 (1) ◽  
pp. 01A127 ◽  
Author(s):  
Hector García ◽  
Helena Castán ◽  
Salvador Dueñas ◽  
Luis Bailón ◽  
Francesca Campabadal ◽  
...  
Keyword(s):  
Growth Temperature ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Electrical Characterization ◽  
Atomic Layer

Optical and electrical characterization of hafnium oxide deposited by liquid injection atomic layer deposition

2007 ◽  
Vol 47 (4-5) ◽  
pp. 825-829 ◽  
Author(s):  
P. Taechakumput ◽  
S. Taylor ◽  
O. Buiu ◽  
R.J. Potter ◽  
P.R. Chalker ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Electrical Characterization ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Liquid Injection

Deposition and electrical characterization of hafnium oxide films on silicon

2008 ◽  
Vol 5 (12) ◽  
pp. 3720-3723 ◽  
Author(s):  
E. Verrelli ◽  
D. Tsoukalas ◽  
D. Kouvatsos
Keyword(s):  
Hafnium Oxide ◽  
Oxide Films ◽  
Electrical Characterization

Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition

2005 ◽  
Vol 45 (5-6) ◽  
pp. 949-952 ◽  
Author(s):  
S. Dueñas ◽  
H. Castán ◽  
H. García ◽  
J. Barbolla ◽  
K. Kukli ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Electrical Characterization ◽  
Atomic Layer ◽  
Layer Deposition

Characterization of Ultra-Thin Hafnium Oxide Films Grown on Silicon by Atomic Layer Deposition Using Tetrakis(ethylmethyl-amino) Hafnium and Water Precursors

2007 ◽  
Vol 19 (13) ◽  
pp. 3127-3138 ◽  
Author(s):  
Y. Wang ◽  
M.-T. Ho ◽  
L. V. Goncharova ◽  
L. S. Wielunski ◽  
S. Rivillon-Amy ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition

Properties of hafnium oxide films grown by atomic layer deposition from hafnium tetraiodide and oxygen

2002 ◽  
Vol 92 (10) ◽  
pp. 5698-5703 ◽  
Author(s):  
Kaupo Kukli ◽  
Mikko Ritala ◽  
Jonas Sundqvist ◽  
Jaan Aarik ◽  
Jun Lu ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition

Optical and electrical characterization of atomic layer deposited (ALD) HfO2/p-GaAs MOS capacitors

2012 ◽  
Author(s):  
Anindita Das ◽  
Sanatan Chattopadhyay ◽  
Goutam K. Dalapati ◽  
Dongzhi Chi ◽  
M. K. Kumar
Keyword(s):  
Electrical Characterization ◽  
Atomic Layer ◽  
Mos Capacitors

Structural and electrical characterization of amorphous lanthanum hafnium oxide thin films

2006 ◽  
Vol 99 (10) ◽  
pp. 103704 ◽  
Author(s):  
Yim Fun Loo ◽  
Stephen Taylor ◽  
Robert T. Murray ◽  
Anthony C. Jones ◽  
Paul R. Chalker
Keyword(s):  
Thin Films ◽  
Hafnium Oxide ◽  
Electrical Characterization ◽  
Oxide Thin Films
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