Study of Ti etching and selectivity mechanism in fluorocarbon plasmas for dielectric etch

2012 ◽  
Vol 30 (2) ◽  
pp. 021804 ◽  
Author(s):  
F. Weilnboeck ◽  
E. Bartis ◽  
S. Shachar ◽  
G. S. Oehrlein ◽  
D. Farber ◽  
...  
Keyword(s):  
Fluorocarbon Plasmas

CF2kinetics and related mechanisms in the presence of polymers in fluorocarbon plasmas

1997 ◽  
Vol 81 (5) ◽  
pp. 2124-2130 ◽  
Author(s):  
A. D. Tserepi ◽  
J. Derouard ◽  
J. P. Booth ◽  
N. Sadeghi
Keyword(s):  
Fluorocarbon Plasmas

Silicon contamination of substrates in fluorocarbon plasmas produced in glass reactors

1994 ◽  
Vol 52 (10) ◽  
pp. 1419-1429 ◽  
Author(s):  
Ferencz Denes ◽  
Majid Sarmadi ◽  
C. E. C. A. Hop ◽  
Milan Buncick ◽  
Raymond Young
Keyword(s):  
Fluorocarbon Plasmas ◽  
Silicon Contamination

SIMULATION OF SI AND SIO2 FEATURE ETCHING IN FLUOROCARBON PLASMAS

2001 ◽  
Author(s):  
GEORGE KOKKORIS ◽  
EVANGELOS GOGOLIDES ◽  
ANDREAS G. BOUDOUVIS
Keyword(s):  
Fluorocarbon Plasmas

Nanotexturing of Polystyrene Surface in Fluorocarbon Plasmas:  From Sticky to Slippery Superhydrophobicity

Langmuir ◽  
2008 ◽  
Vol 24 (9) ◽  
pp. 5044-5051 ◽  
Author(s):  
Rosa Di Mundo ◽  
Fabio Palumbo ◽  
Riccardo d'Agostino
Keyword(s):  
Polystyrene Surface ◽  
Fluorocarbon Plasmas
Sign in / Sign up

Export Citation Format

Share Document