Etching characteristics of high-k dielectric HfO2 thin films in inductively coupled fluorocarbon plasmas

2005 ◽  
Vol 23 (6) ◽  
pp. 1691-1697 ◽  
Author(s):  
Kazuo Takahashi ◽  
Kouichi Ono ◽  
Yuichi Setsuhara
Keyword(s):  
Thin Films ◽  
Inductively Coupled ◽  
Fluorocarbon Plasmas ◽  
High K ◽  
High K Dielectric

Fabrication and Characterization of High-k Dielectric Nickel Titanate Thin Films Using a Modified Sol-Gel Method

2010 ◽  
Vol 94 (1) ◽  
pp. 250-254 ◽  
Author(s):  
Shiow-Huey Chuang ◽  
Min-Lung Hsieh ◽  
Shih-Chieh Wu ◽  
Hong-Cai Lin ◽  
Tien-Sheng Chao ◽  
...  
Keyword(s):  
Thin Films ◽  
Sol Gel ◽  
Gel Method ◽  
Sol Gel Method ◽  
High K ◽  
Nickel Titanate ◽  
Fabrication And Characterization ◽  
High K Dielectric

scholarly journals Laser Ablation Ceramic Target for 8YSZ High-k Dielectric Electrolyte thin Films Precessed by PLD on Si(100) and Pt/Si(111)

2020 ◽  
Vol 71 (7) ◽  
pp. 272-277
Author(s):  
Rovena Veronica Pascu
Keyword(s):  
Thin Films ◽  
X Ray Diffraction ◽  
Stabilized Zirconia ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
High K ◽  
Potential Applications ◽  
Electrochemical Devices ◽  
High K Dielectric

The cubic structure 8YSZ (8%Yttria-Stabilized Zirconia) thin films deposited by PLD(Pulsed Laser Deposition) on substrates Si (100) and Pt/Si (111) by identical control parameters have potential applications as electrolytes for planar micro electrochemical devices like Lambda oxygen sensors and IT-�SOFC. It appearance differences in polycrystalline structural and optical characterization by XRD (X-ray Diffraction), SEM (Scanning Electron Microscope), AFM (Atomic Force Microscopy) and V- VASE (Variable Angle Spectroscopic Ellipsometry. The differences are relating on crystalline dimensions, lattice parameters; surface roughness measured by V- VASE and AFM are presented synthetic to evidence the differences generated by substrates.

Nonvolatile Memory Characteristics Induced in High-k Dielectric Thin Films through Electron Irradiation

2011 ◽  
Vol 59 (2(2)) ◽  
pp. 726-729 ◽  
Author(s):  
Chan-Rock Park ◽  
Hong-Kyoung Lee ◽  
Jin-Ha Hwang ◽  
Young-Hwan Hahn ◽  
Byeong-Cheol Lee ◽  
...  
Keyword(s):  
Thin Films ◽  
Electron Irradiation ◽  
Nonvolatile Memory ◽  
Dielectric Thin Films ◽  
High K ◽  
High K Dielectric ◽  
Memory Characteristics
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