Secondary-electron signal level measurements of self-assembled monolayers for spatial-phase-locked electron-beam lithography

2011 ◽  
Vol 29 (6) ◽  
pp. 06F308 ◽  
Author(s):  
Lin Lee Cheong ◽  
Jose M. Lobez ◽  
Euclid E. Moon ◽  
Jeffrey T. Hastings ◽  
Henry I. Smith
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Secondary Electron ◽  
Self Assembled Monolayers ◽  
Spatial Phase ◽  
Assembled Monolayers ◽  
Self Assembled

Nanoscale Patterning of Protein Using Electron Beam Lithography of Organosilane Self-Assembled Monolayers

Small ◽  
2005 ◽  
Vol 1 (8-9) ◽  
pp. 833-837 ◽  
Author(s):  
Guo-Jun Zhang ◽  
Takashi Tanii ◽  
Tamotsu Zako ◽  
Takumi Hosaka ◽  
Takeo Miyake ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Self Assembled Monolayers ◽  
Nanoscale Patterning ◽  
Assembled Monolayers ◽  
Self Assembled

Electron-Beam-Induced Damage in Self-Assembled Monolayers

1996 ◽  
Vol 100 (39) ◽  
pp. 15900-15909 ◽  
Author(s):  
Kannan Seshadri ◽  
Karl Froyd ◽  
Atul N. Parikh ◽  
David L. Allara ◽  
Michael J. Lercel ◽  
...  
Keyword(s):  
Electron Beam ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes

1995 ◽  
Vol 27 (1-4) ◽  
pp. 43-46 ◽  
Author(s):  
M.J. Lercel ◽  
G.F. Redinbo ◽  
M. Rooks ◽  
R.C. Tiberio ◽  
H.G. Craighead ◽  
...  
Keyword(s):  
Electron Beam ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Self-Assembled Monolayers as High-Resolution Etch Masks and Templates for Organic Molecular Assembly

2000 ◽  
Vol 636 ◽  
Author(s):  
C. K. Harnett ◽  
A. G. Lopez ◽  
K. M. Satyalakshmi ◽  
Y.-F. Chen ◽  
H. G. Craighead
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Molecular Assembly ◽  
Single Step ◽  
Self Assembled Monolayers ◽  
Organic Chemical ◽  
Organic Systems ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Electron Beam Patterning

AbstractWe have used a variety of self-assembled monolayers as resists for low energy electron beam patterning. These compounds can be used as high-resolution patternable linker molecules for selected area binding of proteins and other organic compounds, as well as nanoparticles with organic chemical coatings. Because these systems can be aligned in registry to existing patterns, the organic systems may be positioned with the accuracy of electron-beam lithography. We have also explored the use of self-assembled monolayers for the creation of sub-wavelength artificial dielectric systems. The ultra-thin patterned monolayer is combined with a contrast-enhancing etch process to create high aspect ratio structures. This technique can be used to fabricate diffractive optical devices in a single-step process.

Sign in / Sign up

Export Citation Format

Share Document