Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited Al2O3, HfO2, and nanolaminates on different silicon substrates

F. Campabadal; J. M. Rafí; M. Zabala; O. Beldarrain; A. Faigón; H. Castán; A. Gómez; H. García; S. Dueñas

doi:10.1116/1.3532544

Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited Al2O3, HfO2, and nanolaminates on different silicon substrates

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3532544 ◽

2011 ◽

Vol 29 (1) ◽

pp. 01AA07 ◽

Cited By ~ 33

Author(s):

F. Campabadal ◽

J. M. Rafí ◽

M. Zabala ◽

O. Beldarrain ◽

A. Faigón ◽

...

Keyword(s):

Atomic Layer ◽

Silicon Substrates ◽

Electrical Characteristics ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures

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Electrical characteristics of plasma‐deposited diamondlike carbon/silicon metal–insulator–semiconductor structures

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577875 ◽

1992 ◽

Vol 10 (5) ◽

pp. 3125-3130 ◽

Cited By ~ 10

Author(s):

Jayshree Seth ◽

M. I. Chaudhry ◽

S. V. Babu

Keyword(s):

Electrical Characteristics ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures ◽

Diamondlike Carbon

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Blistering of atomic layer deposition Al2O3 layers grown on silicon and its effect on metal–insulator–semiconductor structures

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4768170 ◽

2013 ◽

Vol 31 (1) ◽

pp. 01A128 ◽

Cited By ~ 16

Author(s):

Oihane Beldarrain ◽

Marta Duch ◽

Miguel Zabala ◽

Joan Marc Rafí ◽

Mireia Bargalló González ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures ◽

Layer Deposition

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Electrical characteristics of DNA-based metal-insulator-semiconductor structures

Journal of Applied Physics ◽

10.1063/1.3447985 ◽

2010 ◽

Vol 107 (12) ◽

pp. 124518 ◽

Cited By ~ 36

Author(s):

S. Sönmezoğlu ◽

Ö. Ateş Sönmezoğlu ◽

G. Çankaya ◽

A. Yıldırım ◽

N. Serin

Keyword(s):

Electrical Characteristics ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures

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Characterization of metal–ferroelectric–metal–insulator–semiconductor structures using ferroelectric Al-doped HfO2 thin films prepared by atomic-layer deposition with different O3 doses

Japanese Journal of Applied Physics ◽

10.7567/1347-4065/ab2c62 ◽

2019 ◽

Vol 58 (7) ◽

pp. 070907 ◽

Cited By ~ 3

Author(s):

So-Yeong Na ◽

So-Jung Yoon ◽

Seung-Youl Kang ◽

Seung-Eon Moon ◽

Sung-Min Yoon

Keyword(s):

Thin Films ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures ◽

Layer Deposition

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Electrical characteristics of Au/Ti/HfO2/n-GaAs metal-insulator-semiconductor structures with high-k interfacial layer

International Journal of Chemistry and Technology ◽

10.32571/ijct.456902 ◽

2018 ◽

Vol 2 (2) ◽

Cited By ~ 6

Author(s):

Abdulkerim KARABULUT ◽

İkram ORAK ◽

Abdülmecit TÜRÜT

Keyword(s):

Interfacial Layer ◽

Electrical Characteristics ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures ◽

High K

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Electrical characteristics of ZrO2-based metal-insulator-semiconductor structures on p-Si

Thin Solid Films ◽

10.1016/0040-6090(92)90122-r ◽

1992 ◽

Vol 207 (1-2) ◽

pp. 193-196 ◽

Cited By ~ 25

Author(s):

T.S. Kalkur ◽

Y.C. Lu

Keyword(s):

Electrical Characteristics ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures

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Effect of HgCdTe native oxide on the electro-physical properties of metal–insulator–semiconductor structures with atomic layer deposited Al2O3

Semiconductor Science and Technology ◽

10.1088/1361-6641/ab6105 ◽

2020 ◽

Vol 35 (2) ◽

pp. 025019

Author(s):

Evgeny R Zakirov ◽

Valeriy G Kesler ◽

Georgiy Yu Sidorov ◽

Anatoliy P Kovchavtsev

Keyword(s):

Physical Properties ◽

Atomic Layer ◽

Native Oxide ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures

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Electrical properties of GaN-based metal–insulator–semiconductor structures with Al2O3deposited by atomic layer deposition using water and ozone as the oxygen precursors

Semiconductor Science and Technology ◽

10.1088/0268-1242/29/4/045004 ◽

2014 ◽

Vol 29 (4) ◽

pp. 045004 ◽

Cited By ~ 25

Author(s):

Toshiharu Kubo ◽

Joseph J Freedsman ◽

Yasuhiro Iwata ◽

Takashi Egawa

Keyword(s):

Electrical Properties ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures ◽

Layer Deposition

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Bias stress study of Metal-Insulator-Semiconductor structures with pulsed laser deposited InGaZnO on atomic layer deposited HfO2

2015 IEEE International Autumn Meeting on Power, Electronics and Computing (ROPEC) ◽

10.1109/ropec.2015.7395135 ◽

2015 ◽

Author(s):

S. I. Garduno ◽

M. Estrada ◽

I. Hernandez ◽

A. Cerdeira ◽

J. I. Mejia ◽

...

Keyword(s):

Pulsed Laser ◽

Atomic Layer ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Bias Stress ◽

Semiconductor Structures ◽

Stress Study

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Influence of ultrashort pulses of electromagnetic radiation on parameters of metal-insulator-semiconductor structures

Semiconductors ◽

10.1134/1.1836058 ◽

2004 ◽

Vol 38 (12) ◽

pp. 1390-1393

Author(s):

V. A. Terekhov ◽

A. N. Man’ko ◽

E. N. Bormontov ◽

V. N. Levchenko ◽

S. Yu. Trebunskikh ◽

...

Keyword(s):

Electromagnetic Radiation ◽

Ultrashort Pulses ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures

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