Kinetic modeling of the effect of electron beam pulse duration on abatement of carbon tetrafluoride using O2 as an additive gas

2009 ◽  
Vol 27 (6) ◽  
pp. 1271-1274
Author(s):  
Susumu Kato ◽  
Isao Okuda ◽  
Eiichi Takahashi ◽  
Yuji Matsumoto
Keyword(s):  
Electron Beam ◽  
Pulse Duration ◽  
Kinetic Modeling ◽  
Carbon Tetrafluoride ◽  
Electron Beam Pulse

scholarly journals Supershort avalanche electron beam generation in gases

2008 ◽  
Vol 26 (4) ◽  
pp. 605-617 ◽  
Author(s):  
V.F. Tarasenko ◽  
E.H. Baksht ◽  
A.G. Burachenko ◽  
I.D. Kostyrya ◽  
M.I. Lomaev ◽  
...  
Keyword(s):  
High Pressure ◽  
Electron Beam ◽  
Atmospheric Pressure ◽  
Electron Beams ◽  
Solid Angle ◽  
Generation Mechanism ◽  
Full Width ◽  
Half Maximum ◽  
Electron Beam Pulse ◽  
Supershort Avalanche Electron Beam

AbstractThis paper reports on the properties of a supershort avalanche electron beam generated in the air or other gases under atmospheric pressure and gives the analysis of a generation mechanism of supershort avalanche electron beam, as well as methods of such electron beams registration. It is reported that in the air under the pressure of 1 atm, a supershort (<100 ps) avalanche electron beam is formed in the solid angle more than 2π steradian. The electron beam has been obtained behind a 45 µm thick Al-Be foil in SF6 and Xe under the pressure of 2 atm, and in He, under the pressure of about 15 atm. It is shown that in SF6 under the high pressure (>1 atm) duration (full width at half maximum) of supershort avalanche electron beam pulse is about 150 ps.

Evolution of an electron beam pulse influenced by coulomb collision effects in the solar corona

2020 ◽  
Vol 65 (3) ◽  
pp. 1062-1069
Author(s):  
G.A. Casillas-Pérez ◽  
S. Jeyakumar ◽  
A. Carrillo-Vargas ◽  
H.R. Pérez-Enríquez
Keyword(s):  
Electron Beam ◽  
Solar Corona ◽  
Coulomb Collision ◽  
Electron Beam Pulse

Kinetic modeling of benzene and toluene decomposition in air and in flue gas under electron beam irradiation

2012 ◽  
Vol 81 (5) ◽  
pp. 572-579 ◽  
Author(s):  
Henrieta Nichipor ◽  
Elena Dashouk ◽  
Svetlana Yacko ◽  
Yongxia Sun ◽  
Andrzej G. Chmielewski ◽  
...  
Keyword(s):  
Electron Beam ◽  
Kinetic Modeling ◽  
Flue Gas ◽  
Electron Beam Irradiation ◽  
Beam Irradiation

Kinetic modeling and simulation of PCE and TCE removal in aqueous solutions by electron-beam irradiation

2002 ◽  
Vol 65 (4-5) ◽  
pp. 579-587 ◽  
Author(s):  
Michael G. Nickelsen ◽  
William J. Cooper ◽  
David A. Secker ◽  
Louis A. Rosocha ◽  
Charles N. Kurucz ◽  
...  
Keyword(s):  
Electron Beam ◽  
Aqueous Solutions ◽  
Modeling And Simulation ◽  
Kinetic Modeling ◽  
Electron Beam Irradiation ◽  
Beam Irradiation

scholarly journals Observation of the tungsten surface damage under ITER-relevant transient heat loads during and after electron beam pulse

2016 ◽  
Author(s):  
A. A. Vasilyev ◽  
A. S. Arakcheev ◽  
I. A. Bataev ◽  
V. A. Bataev ◽  
A. V. Burdakov ◽  
...  
Keyword(s):  
Electron Beam ◽  
Surface Damage ◽  
Electron Beam Pulse ◽  
Tungsten Surface ◽  
Heat Loads

A Study of Electrically Active Defects Induced by Pulsed Electron Beam Annealing In (100) N-Type Virgin Silicon

1984 ◽  
Vol 35 ◽  
Author(s):  
M.S. Doghmane ◽  
D. Barbier ◽  
A. Laugier
Keyword(s):  
Surface Layer ◽  
Electron Beam ◽  
Layer Thickness ◽  
Schottky Contacts ◽  
Probable Mechanism ◽  
Electron Trap ◽  
Melting Layer ◽  
Pulsed Electron Beam ◽  
Depth Profiles ◽  
Electron Beam Pulse

ABSTRACTAu/Si Schottky contacts have been used as test structures to investigate defects induced in virgin C.Z (100) N-type silicon after irradiation with a 12 to 20 KeV mean energy electron beam pulse. A thin and highly damaged surface layer was observed from a fluence threshold of 1 J/cm2. In addition electron traps were detected in the PEBA induced melting layer with concentrations in the 1012-1013 cm-3 range. Their depth profiles have been related to the PEBA induced melting layer thickness. Quenching of multidefect complexes is the most probable mechanism for electron trap generation in the processed layer.

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