High-resolution Rutherford backscattering spectrometry study on process dependent elemental depth profile change of hafnium silicate on silicon

2009 ◽  
Vol 27 (4) ◽  
pp. 937-942 ◽  
Author(s):  
C. Ichihara ◽  
S. Yasuno ◽  
H. Takeuchi ◽  
A. Kobayashi ◽  
S. Mure ◽  
...  
2008 ◽  
Vol 37 (6) ◽  
pp. 595-598 ◽  
Author(s):  
Xiangjun Wei ◽  
Yong Lei ◽  
Tianxi Sun ◽  
Xiaoyan Lin ◽  
Qing Xu ◽  
...  

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