Elemental depth profile of faux bamboo paint in Forbidden City studied by synchrotron radiation confocal µ-XRF

Xiangjun Wei; Yong Lei; Tianxi Sun; Xiaoyan Lin; Qing Xu; Dongliang Chen; Yang Zou; Zheng Jiang; Yuying Huang; Xiaohan Yu; Xunliang Ding; Hongjie Xu

doi:10.1002/xrs.1098

Elemental depth profile of faux bamboo paint in Forbidden City studied by synchrotron radiation confocal µ-XRF

X-Ray Spectrometry ◽

10.1002/xrs.1098 ◽

2008 ◽

Vol 37 (6) ◽

pp. 595-598 ◽

Cited By ~ 20

Author(s):

Xiangjun Wei ◽

Yong Lei ◽

Tianxi Sun ◽

Xiaoyan Lin ◽

Qing Xu ◽

...

Keyword(s):

Synchrotron Radiation ◽

Depth Profile ◽

Elemental Depth ◽

Elemental Depth Profile

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High-resolution Rutherford backscattering spectrometry study on process dependent elemental depth profile change of hafnium silicate on silicon

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3125263 ◽

2009 ◽

Vol 27 (4) ◽

pp. 937-942 ◽

Cited By ~ 1

Author(s):

C. Ichihara ◽

S. Yasuno ◽

H. Takeuchi ◽

A. Kobayashi ◽

S. Mure ◽

...

Keyword(s):

High Resolution ◽

Depth Profile ◽

Rutherford Backscattering Spectrometry ◽

Rutherford Backscattering ◽

Hafnium Silicate ◽

Elemental Depth ◽

Profile Change ◽

Elemental Depth Profile

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Elemental depth profile analysis of hard coatings of tungsten carbide by auger electron (AES-) microprobe/sputtering

Fresenius Zeitschrift für Analytische Chemie ◽

10.1007/bf00473349 ◽

1986 ◽

Vol 324 (2) ◽

pp. 111-119 ◽

Cited By ~ 3

Author(s):

Rainer P. H. Garten

Keyword(s):

Tungsten Carbide ◽

Depth Profile ◽

Auger Electron ◽

Profile Analysis ◽

Hard Coatings ◽

Depth Profile Analysis ◽

Elemental Depth ◽

Elemental Depth Profile

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Controlled Elemental Depth Profile in Sol–Gel-Derived PZT Films

Journal of the American Ceramic Society ◽

10.1111/j.1551-2916.2006.01078.x ◽

2006 ◽

Vol 89 (8) ◽

pp. 2387-2393 ◽

Cited By ~ 25

Author(s):

Aleksey Etin ◽

Gennady E. Shter ◽

Sioma Baltianski ◽

Gideon S. Grader ◽

George M. Reisner

Keyword(s):

Depth Profile ◽

Sol Gel ◽

Pzt Films ◽

Elemental Depth ◽

Elemental Depth Profile

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An angle‐resolved, wavelength‐dispersive x‐ray fluorescence spectrometer for depth profile analysis of ion‐implanted semiconductors using synchrotron radiation

Review of Scientific Instruments ◽

10.1063/1.1143080 ◽

1992 ◽

Vol 63 (1) ◽

pp. 1194-1197 ◽

Cited By ~ 4

Author(s):

W. Schmitt ◽

J. Hormes ◽

U. Kuetgens ◽

W. H. Gries

Keyword(s):

Synchrotron Radiation ◽

Depth Profile ◽

Profile Analysis ◽

Depth Profile Analysis ◽

X Ray ◽

Fluorescence Spectrometer ◽

Ion Implanted

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In-Depth Profile of Hf-Based Gate Insulator Films on Si Substrates Studied by Angle-Resolved Photoelectron Spectroscopy Using Synchrotron Radiation

Journal of Surface Analysis ◽

10.1384/jsa.15.299 ◽

2009 ◽

Vol 15 (3) ◽

pp. 299-302 ◽

Cited By ~ 4

Author(s):

S. Toyoda ◽

H. Kumigashira ◽

M. Oshima ◽

G. L. Liu ◽

Z. Liu ◽

...

Keyword(s):

Synchrotron Radiation ◽

Depth Profile ◽

Photoelectron Spectroscopy ◽

Gate Insulator ◽

Si Substrates

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Application of high-energy synchrotron-radiation X-ray photoelectron spectroscopy to the depth profile analysis of oxide layer on Si(100) surfaces.

BUNSEKI KAGAKU ◽

10.2116/bunsekikagaku.45.169 ◽

1996 ◽

Vol 45 (2) ◽

pp. 169-174 ◽

Cited By ~ 1

Author(s):

Hiroyuki YAMAMOTO ◽

Yuji BABA ◽

Teikichi A.SASAKI

Keyword(s):

Synchrotron Radiation ◽

Oxide Layer ◽

Depth Profile ◽

Photoelectron Spectroscopy ◽

Profile Analysis ◽

High Energy ◽

Depth Profile Analysis ◽

X Ray

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In-depth Profile Analysis in Metal/high-k Gate Stack Structures Studied by Synchrotron-radiation Photoelectron Spectroscopy

Hyomen Kagaku ◽

10.1380/jsssj.31.441 ◽

2010 ◽

Vol 31 (9) ◽

pp. 441-447

Author(s):

Satoshi TOYODA ◽

Hiroyuki KAMADA ◽

Hiroshi KUMIGASHIRA ◽

Masaharu OSHIMA ◽

Kunihiko IWAMOTO ◽

...

Keyword(s):

Synchrotron Radiation ◽

Depth Profile ◽

Photoelectron Spectroscopy ◽

Profile Analysis ◽

Depth Profile Analysis ◽

Gate Stack ◽

High K

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Hydrogen depth profile of Al-alloy vacuum chamber exposed to synchrotron radiation

Vacuum ◽

10.1016/0042-207x(93)90003-s ◽

1993 ◽

Vol 44 (1) ◽

pp. 7-10 ◽

Cited By ~ 5

Author(s):

K Kanazawa ◽

M Yanokura ◽

M Aratani ◽

H Akiyama

Keyword(s):

Synchrotron Radiation ◽

Depth Profile ◽

Vacuum Chamber ◽

Al Alloy

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A new method of depth profile determination by synchrotron radiation

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/0168-583x(92)95323-j ◽

1992 ◽

Vol 71 (2) ◽

pp. 204-208 ◽

Cited By ~ 4

Author(s):

K. Abbas ◽

P. Midy ◽

I. Brissaud ◽

P. Chevallierr

Keyword(s):

Synchrotron Radiation ◽

Depth Profile ◽

New Method

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Non-destructive depth profile analysis for surface and buried interface of Ge thin film on Si substrate by high-energy synchrotron radiation x-ray photoelectron spectroscopy

Journal of Physics Conference Series ◽

10.1088/1742-6596/100/1/012044 ◽

2008 ◽

Vol 100 (1) ◽

pp. 012044 ◽

Cited By ~ 3

Author(s):

H Yamamoto ◽

Y Yamada ◽

M Sasase ◽

F Esaka

Keyword(s):

Thin Film ◽

Synchrotron Radiation ◽

Depth Profile ◽

Photoelectron Spectroscopy ◽

Profile Analysis ◽

High Energy ◽

Si Substrate ◽

Depth Profile Analysis ◽

X Ray ◽

Non Destructive

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