The use of ionic liquid ion sources in focused ion beam applications

2008 ◽  
Vol 26 (6) ◽  
pp. 2097-2102 ◽  
Author(s):  
Anthony N. Zorzos ◽  
Paulo C. Lozano
Keyword(s):  
Ionic Liquid ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Sources

Mini rf-driven ion sources for focused ion beam systems

2003 ◽  
Vol 74 (4) ◽  
pp. 2288-2292 ◽  
Author(s):  
X. Jiang ◽  
Q. Ji ◽  
A. Chang ◽  
K. N. Leung
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Sources

Further Inquiry into Xe Primary Ion Species for Circuit Edit Application

2017 ◽  
Author(s):  
Valery Ray ◽  
Ali Hadjikhani ◽  
Joseph Favata ◽  
Seyedeh Ahmadi ◽  
Sina Shahbazmohamadi
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Beam Current ◽  
Ion Sources ◽  
Advanced Technology ◽  
Semiconductor Materials ◽  
Beam Current Density ◽  
Fundamental Limitations ◽  
Technology Nodes ◽  
Ion Species

Abstract Widespread adoption and significant developments in Focused Ion Beam technology has made FIB/SEM instrumentation a commonplace sample preparation tool. Fundamental limitations inherent to Ga ion species complicate usage of Ga+ FIB instruments for the modification of semiconductor devices on advanced technology nodes. Said limitations are fueling interest in exploring alternative primary species and ion beam technologies for circuit edit applications. Exploratory tests of etching typical semiconductor materials with Xe ion beams generated from two plasma ion sources confirmed advantages of Xe+ as a potential ion species for gas-assisted etching of semiconductor materials, but also revealed potential complications including, swelling of metal and Xe+ retention within the material arising from excessive Xe ion beam current density.

Development of high-current ionic liquid ion source toward surface modification

2013 ◽  
Vol 1575 ◽  
Author(s):  
Mitsuaki Takeuchi ◽  
Takuya Hamaguchi ◽  
Hiromichi Ryuto ◽  
Gikan H Takaoka
Keyword(s):  
Ionic Liquid ◽  
Surface Modification ◽  
Flow Rate ◽  
Ion Beam ◽  
Beam Current ◽  
Ion Source ◽  
Ion Sources ◽  
Ion Current ◽  
High Current ◽  
Beam Characteristics

ABSTRACTIonic liquid (IL) ion sources with different emitter tip materials and tip numbers were developed and examined on ion beam characteristics with respect to its ILs wettability. As a result of ion current measurements, the most stable emission current was obtained for the graphite emitter tip and the ion current increased with increase of the tip number. The results indicate that the emitter wettability corresponding to the supplying flow rate and the number of emission site play an important role to stabilize and increase the beam current.

Rare earth focused ion beam implantation utilizing Er and Pr liquid alloy ion sources

1999 ◽  
Vol 17 (6) ◽  
pp. 2791 ◽  
Author(s):  
L. C. Chao ◽  
B. K. Lee ◽  
C. J. Chi ◽  
J. Cheng ◽  
I. Chyr ◽  
...  
Keyword(s):  
Rare Earth ◽  
Liquid Alloy ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Sources ◽  
Ion Beam Implantation

A novel approach to gaseous field ion sources for focused ion beam applications

1999 ◽  
Vol 79 (1-4) ◽  
pp. 225-230 ◽  
Author(s):  
M.K Miller ◽  
S.J Sijbrandij
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Sources ◽  
Novel Approach
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