Structure and mechanical properties of diamondlike carbon films produced by hollow-cathode plasma deposition

2008 ◽  
Vol 26 (5) ◽  
pp. 1149-1153 ◽  
Author(s):  
H. F. Jiang ◽  
X. B. Tian ◽  
S. Q. Yang ◽  
R. K. Y. Fu ◽  
P. K. Chu
1989 ◽  
Vol 65 (5) ◽  
pp. 1918-1922 ◽  
Author(s):  
Shigeki Hoshino ◽  
Kazutaka Fujii ◽  
Nobuaki Shohata ◽  
Hirotaka Yamaguchi ◽  
Yuji Tsukamoto ◽  
...  

2001 ◽  
Vol 697 ◽  
Author(s):  
L. G. Jacobsohn ◽  
F. L. Freire

AbstractWe investigated the deposition, structure and mechanical properties of a-C:H films grown in Ar-CH4 mixtures with the Ar partial pressure ranging from 0 to 99 %. The deposition rate strongly decreased with progressive Ar dilution of the CH4 atmosphere. Films deposited in pure CH4 atmospheres have a hydrogen content of 20 at.% that showed a trend to decrease for lower CH4 partial pressures, while the density remained nearly constant at around 1.4x1023 at./cm3. Raman spectroscopy and x-ray diffraction revealed the amorphous character of the films. The compressive internal stress remained constant around 2.5 GPa and the hardness decreases for Ar rich precursor atmospheres.


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