Sidewall passivation assisted by a silicon coverplate during Cl[sub 2]–H[sub 2] and HBr inductively coupled plasma etching of InP for photonic devices
2005 ◽
Vol 34
(6)
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pp. 740-745
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2015 ◽
Vol 32
(5)
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pp. 058102
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1999 ◽
Vol 17
(3)
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pp. 768-773
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