Effect of additive noble gases in chlorine-based inductively coupled plasma etching of GaN, InN, and AlN
1999 ◽
Vol 17
(3)
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pp. 768-773
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2005 ◽
Vol 34
(6)
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pp. 740-745
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2015 ◽
Vol 32
(5)
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pp. 058102
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2011 ◽
Vol 50
(6)
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pp. 06GG07
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2010 ◽
Vol 46
(01)
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pp. 182
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