Compositional effect on the dielectric properties of high-k titanium silicate thin films deposited by means of a cosputtering process
2006 ◽
Vol 24
(3)
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pp. 600-605
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2007 ◽
Vol 2007.43
(0)
◽
pp. 31-32
2003 ◽
Vol 57
(26-27)
◽
pp. 4297-4301
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Keyword(s):
Keyword(s):
2004 ◽
Vol 22
(3)
◽
pp. 851
◽
Keyword(s):