Pulsed-laser deposition of high-k titanium silicate thin films

D. Brassard; M. A. El Khakani

doi:10.1063/1.2039274

Pulsed-laser deposition of high-k titanium silicate thin films

Journal of Applied Physics ◽

10.1063/1.2039274 ◽

2005 ◽

Vol 98 (5) ◽

pp. 054912 ◽

Cited By ~ 14

Author(s):

D. Brassard ◽

M. A. El Khakani

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Titanium Silicate ◽

High K

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High-k titanium silicate dielectric thin films grown by pulsed-laser deposition

Applied Physics Letters ◽

10.1063/1.1435072 ◽

2002 ◽

Vol 80 (2) ◽

pp. 294-296 ◽

Cited By ~ 47

Author(s):

D. K. Sarkar ◽

E. Desbiens ◽

M. A. El Khakani

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Titanium Silicate ◽

Dielectric Thin Films ◽

High K

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Multilevel Resistive Memory Switching in Amorphous Ternary High K-Dielectric Oxide LaGdO3 Thin Films Grown By Pulsed Laser Deposition

ECS Meeting Abstracts ◽

10.1149/ma2014-01/39/1466 ◽

2014 ◽

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Resistive Memory ◽

Memory Switching ◽

High K ◽

High K Dielectric

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Low-temperature growth of high-k thin films by ultraviolet-assisted pulsed laser deposition

Applied Surface Science ◽

10.1016/s0169-4332(00)00615-2 ◽

2000 ◽

Vol 168 (1-4) ◽

pp. 123-126 ◽

Cited By ~ 11

Author(s):

V. Craciun ◽

J.M. Howard ◽

N.D. Bassim ◽

R.K. Singh

Keyword(s):

Thin Films ◽

Low Temperature ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Temperature Growth ◽

Low Temperature Growth ◽

High K

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Preparation by pulsed laser deposition and characterization of ZrO/sub 2/, HfO/sub 2/ and PrO/sub x/ thin films for high-k gate insulator

Proceedings of the 13th IEEE International Symposium on Applications of Ferroelectrics, 2002. ISAF 2002. ◽

10.1109/isaf.2002.1195904 ◽

2003 ◽

Author(s):

T. Kanashima ◽

S. Kaitai ◽

M. Sohgawa ◽

H. Kanda ◽

M. Okuyama

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Gate Insulator ◽

Laser Deposition ◽

High K

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Dielectric properties of YSZ high-k thin films fabricated at low temperature by pulsed laser deposition

Materials Letters ◽

10.1016/s0167-577x(03)00306-9 ◽

2003 ◽

Vol 57 (26-27) ◽

pp. 4297-4301 ◽

Cited By ~ 23

Author(s):

J. Zhu ◽

Z.G. Liu

Keyword(s):

Thin Films ◽

Dielectric Properties ◽

Low Temperature ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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Preparation and Characterization of High-k Lanthanoid Oxide Thin Films Deposited by Pulsed Laser Deposition

10.7567/ssdm.2001.b-8-5 ◽

2001 ◽

Author(s):

Satoshi Kitai ◽

Osamu Maida ◽

Takeshi Kanashima ◽

Masanori Okuyama

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Oxide Thin Films ◽

High K

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Heteroepitaxial Growth of High K Dielectric Thin Films by Pulsed Laser Deposition

Integrated Ferroelectrics ◽

10.1080/10584580390259416 ◽

2003 ◽

Vol 55 (1) ◽

pp. 947-954 ◽

Cited By ~ 2

Author(s):

W. M. Yu ◽

K. H. Wong

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Heteroepitaxial Growth ◽

Dielectric Thin Films ◽

High K ◽

High K Dielectric

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Pulsed laser deposition and characterization of Hf-based high-k dielectric thin films

Thin Solid Films ◽

10.1016/j.tsf.2006.11.171 ◽

2007 ◽

Vol 515 (16) ◽

pp. 6548-6551 ◽

Cited By ~ 17

Author(s):

Mehmet Alper Sahiner ◽

Joseph C. Woicik ◽

Peng Gao ◽

Patrick McKeown ◽

Mark C. Croft ◽

...

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Dielectric Thin Films ◽

High K ◽

High K Dielectric

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Novel Al1.997Hf0.003O3 High-k gate dielectric thin films grown by pulsed laser deposition using pre-synthesized target material

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-021-05751-7 ◽

2021 ◽

Author(s):

Annie Maria Mahat ◽

Mohd Sufri Mastuli ◽

Nurhanna Badar ◽

Norlida Kamarulzaman

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Gate Dielectric ◽

Pulsed Laser ◽

Target Material ◽

Laser Deposition ◽

Dielectric Thin Films ◽

High K ◽

High K Gate Dielectric

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Epitaxial La[sub 2]Hf[sub 2]O[sub 7] thin films on Si(001) substrates grown by pulsed laser deposition for high-k gate dielectrics

Applied Physics Letters ◽

10.1063/1.2828692 ◽

2008 ◽

Vol 92 (1) ◽

pp. 012901 ◽

Cited By ~ 19

Author(s):

Feng Wei ◽

Hailing Tu ◽

Yi Wang ◽

Shoujing Yue ◽

Jun Du

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Gate Dielectrics ◽

Pulsed Laser ◽

Laser Deposition ◽

High K

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