Optimization of an inductively coupled plasma etching process of GaInP∕GaAs based material for photonic band gap applications
2005 ◽
Vol 23
(4)
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pp. 1521
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2011 ◽
Vol 4
(1)
◽
pp. 34-39
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2011 ◽
Vol 29
(5)
◽
pp. 051802
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2004 ◽
Vol 22
(4)
◽
pp. 1847-1851
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2005 ◽
Vol 34
(6)
◽
pp. 740-745
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