Sub-100 nm radius of curvature wide-band gap III-nitride vacuum microelectronic field emitter structures created by inductively coupled plasma etching

2004 ◽  
Vol 22 (4) ◽  
pp. 1847-1851 ◽  
Author(s):  
P. B. Shah ◽  
B. M. Nichols ◽  
M. D. Derenge ◽  
K. A. Jones
Keyword(s):  
Band Gap ◽  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Wide Band ◽  
Radius Of Curvature ◽  
Wide Band Gap ◽  
Field Emitter ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled ◽  
Vacuum Microelectronic

Inductively coupled plasma etching for delineation of InAs/GaSb pixels

2012 ◽  
Author(s):  
Jean Nguyen ◽  
John Gill ◽  
Sir B. Rafol ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

2005 ◽  
Vol 34 (6) ◽  
pp. 740-745 ◽  
Author(s):  
E. Laffosse ◽  
J. Baylet ◽  
J. P. Chamonal ◽  
G. Destefanis ◽  
G. Cartry ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Fabrication of GaN nanorods by inductively coupled plasma etching via SiO2 nanosphere lithography

2009 ◽  
Vol 517 (14) ◽  
pp. 3859-3861 ◽  
Author(s):  
Byung-Jae Kim ◽  
Hyunjung Jung ◽  
Hong-Yeol Kim ◽  
Joona Bang ◽  
Jihyun Kim
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Nanosphere Lithography ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Factors Affecting the Top Stripping of GaAs Microwire Array Fabricated by Inductively Coupled Plasma Etching

2015 ◽  
Vol 32 (5) ◽  
pp. 058102 ◽  
Author(s):  
Ying Cheng ◽  
Ji-Jun Zou ◽  
Ming Wan ◽  
Wei-Lu Wang ◽  
Xin-Cun Peng ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Factors Affecting ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled
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