Photoresist stripping after low-k dielectric layer patterning using axial magnetic field assisted reactive ion etching

2005 ◽  
Vol 23 (4) ◽  
pp. 886-889
Author(s):  
Ho-Young Song ◽  
Chin-Woo Kim ◽  
Se-Geun Park ◽  
Jae-Kyoon Yang ◽  
Chang-Weon Lee
Keyword(s):  
Magnetic Field ◽  
Dielectric Layer ◽  
Axial Magnetic Field ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Low K

Automated Sample Preparation of Low-k Dielectrics for FESEM

2005 ◽  
Author(s):  
R. R. Cerchiara ◽  
H. A. Cook ◽  
P. E. Fischione ◽  
J. J. Gronsky ◽  
J. M. Matesa ◽  
...  
Keyword(s):  
Sample Preparation ◽  
Ion Beam ◽  
Reactive Ion Etching ◽  
Copper Interconnects ◽  
Plasma Cleaning ◽  
Ion Etching ◽  
Ion Beam Etching ◽  
Automated Sample Preparation ◽  
Microelectronic Materials ◽  
Low K

Abstract The SiLK resins, composed of aromatic hydrocarbons, are a family of highly cross-linked thermoset polymers with isotropic dielectric properties. Patterning of SiLK for high aspect ratio copper interconnects has depended on reactive ion etching with oxygen/nitrogen gas mixtures. Reactive ion etching is therefore also accomplished with reducing plasmas such as nitrogen/hydrogen. An additional plasma cleaning step can be inserted after the reactive ion etching (RIE) step, so that any residual contamination is removed prior to imaging or final sputter coating. Automated sample preparation of microelectronic materials containing high and low-k dielectrics for FESEM is accomplished in this article by combining these techniques: plasma cleaning, ion beam etching, and reactive ion etching. A single RIE chemistry was effective in etching both dielectrics as well as delineating the other phases present.

Reactive ion etching of Al alloy and silicon dioxide films in a rotating magnetic field

1994 ◽  
Author(s):  
Masafumi Tanabe ◽  
Akio Matsuda ◽  
Takeshi Sunada ◽  
Taro Nomura ◽  
Hideki Fujimoto ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Silicon Dioxide ◽  
Reactive Ion Etching ◽  
Rotating Magnetic Field ◽  
Al Alloy ◽  
Ion Etching ◽  
Silicon Dioxide Films

Magnetic field-assisted finishing for micropore X-ray focusing mirrors fabricated by deep reactive ion etching

CIRP Annals ◽  
2010 ◽  
Vol 59 (1) ◽  
pp. 351-354 ◽  
Author(s):  
H. Yamaguchi ◽  
R.E. Riveros ◽  
I. Mitsuishi ◽  
U. Takagi ◽  
Y. Ezoe ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
X Ray

Reactive Ion Etching and Characterization of p-Silk Ultra Low-k Film

2005 ◽  
Vol 18 (1) ◽  
pp. 174-181 ◽  
Author(s):  
B.R. Murthy ◽  
M.M. Mukherjee-Roy ◽  
A. Krishnamoorthy ◽  
D.C. Frye
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
Low K

Magnetic Ceramic Films from a Metallopolymer Resist Using Reactive Ion Etching in a Secondary Magnetic Field

2004 ◽  
Vol 16 (4) ◽  
pp. 291-296 ◽  
Author(s):  
S. B. Clendenning ◽  
S. Han ◽  
N. Coombs ◽  
C. Paquet ◽  
M. S. Rayat ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Ceramic Films

Charge Build-Up and Uniformity Control in Magnetically Enhanced Reactive Ion Etching Using a Curved Lateral Magnetic Field

1994 ◽  
Vol 33 (Part 1, No. 4B) ◽  
pp. 2194-2199 ◽  
Author(s):  
Satoshi Nakagawa ◽  
Tomoyuki Sasaki ◽  
Hajime Mori ◽  
Takashi Namura
Keyword(s):  
Magnetic Field ◽  
Reactive Ion Etching ◽  
Ion Etching

scholarly journals The effects of a surface magnetic field on reactive ion etching

1991 ◽  
Vol 69 (1) ◽  
pp. 447-451
Author(s):  
Haewook Han ◽  
Ki‐Woong Whang
Keyword(s):  
Magnetic Field ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Surface Magnetic Field
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