Reactive ion etching of Al alloy and silicon dioxide films in a rotating magnetic field

1994 ◽  
Author(s):  
Masafumi Tanabe ◽  
Akio Matsuda ◽  
Takeshi Sunada ◽  
Taro Nomura ◽  
Hideki Fujimoto ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Silicon Dioxide ◽  
Reactive Ion Etching ◽  
Rotating Magnetic Field ◽  
Al Alloy ◽  
Ion Etching ◽  
Silicon Dioxide Films

Reactive Ion Etching of Al Alloy Films in a Rotating Magnetic Field

1993 ◽  
Vol 32 (Part 1, No. 2) ◽  
pp. 747-752
Author(s):  
Masafumi Tanabe ◽  
Akio Matsuda ◽  
Takeshi Sunada ◽  
Hideki Fujimoto ◽  
Toshio Hayashi
Keyword(s):  
Magnetic Field ◽  
Reactive Ion Etching ◽  
Rotating Magnetic Field ◽  
Al Alloy ◽  
Ion Etching ◽  
Alloy Films

Radiation damage in silicon dioxide films exposed to reactive ion etching

1979 ◽  
Vol 50 (6) ◽  
pp. 4015-4021 ◽  
Author(s):  
D. J. DiMaria ◽  
L. M. Ephrath ◽  
D. R. Young
Keyword(s):  
Silicon Dioxide ◽  
Radiation Damage ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Silicon Dioxide Films

Reactive ion etching of Fe-Si-Al alloy for thin film head

1991 ◽  
Vol 27 (6) ◽  
pp. 4888-4890 ◽  
Author(s):  
K. Kinoshita ◽  
K. Yamada ◽  
H. Matsutera
Keyword(s):  
Thin Film ◽  
Reactive Ion Etching ◽  
Al Alloy ◽  
Ion Etching

Reactive Ion Etching Of Silicon Dioxide

1987 ◽  
Author(s):  
Peter C. Sukanek ◽  
Glynis Sullivan
Keyword(s):  
Silicon Dioxide ◽  
Reactive Ion Etching ◽  
Ion Etching

Removal of surface contamination after reactive ion etching of silicon dioxide

Vacuum ◽  
1994 ◽  
Vol 45 (5) ◽  
pp. 519-524 ◽  
Author(s):  
R Jackson ◽  
AJ Pidduck ◽  
MA Green
Keyword(s):  
Silicon Dioxide ◽  
Reactive Ion Etching ◽  
Surface Contamination ◽  
Ion Etching
Sign in / Sign up

Export Citation Format

Share Document