Optimization of post-N[sub 2] treatment and undoped-Si-glass cap to improve metal wring delamination in deep submicron high-density plasma-fluorinated silica glass intermetal dielectric application
2004 ◽
Vol 22
(4)
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pp. 1792
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Keyword(s):
Keyword(s):
1998 ◽
Vol 37
(Part 1, No. 3B)
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pp. 1222-1227
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2006 ◽
Vol 24
(2)
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pp. 249-254
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Keyword(s):
1999 ◽
Vol 28
(4)
◽
pp. 347-354
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Keyword(s):
1995 ◽
Vol 142
(11)
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pp. L208-L211
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