Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems

2003 ◽  
Vol 21 (4) ◽  
pp. 1550-1562 ◽  
Author(s):  
Ivo W. Rangelow
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Microelectromechanical Systems ◽  
Dry Etching

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

2017 ◽  
Vol 180 ◽  
pp. 20-24 ◽  
Author(s):  
Y. Lisunova ◽  
M. Spieser ◽  
R.D.D. Juttin ◽  
F. Holzner ◽  
J. Brugger
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Dry Etching ◽  
Scanning Probe ◽  
Scanning Probe Lithography

High-Aspect-Ratio Structures for MEMS

MRS Bulletin ◽  
2001 ◽  
Vol 26 (4) ◽  
pp. 307-308 ◽  
Author(s):  
Stella W. Pang
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Electromechanical Coupling ◽  
Microelectromechanical Systems ◽  
Parallel Plates ◽  
Increased Sensitivity ◽  
Micromechanical Structures

Many microelectromechanical systems (MEMS) use the changing capacitance of movable parallel plates to drive and sense motion. An increase in this capacitance improves the performance of these micromechanical structures by means of increased electromechanical coupling for lower driving voltages and increased sensitivity of the micromechanical motion.

Dry Etching of High Aspect Ratio 4H-SiC Microstructures

2017 ◽  
Vol 6 (4) ◽  
pp. P207-P210 ◽  
Author(s):  
Lunet E. Luna ◽  
Marko J. Tadjer ◽  
Travis J. Anderson ◽  
Eugene A. Imhoff ◽  
Karl D. Hobart ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Dry Etching

High-Aspect-Ratio Nanometer-Pattern Fabrication Using Fullerene-Incorporated Nanocomposite Resists for Dry-Etching Application

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7642-7645 ◽  
Author(s):  
Tomohiro Shibata ◽  
Tetsuyoshi Ishii ◽  
Hiroshi Nozawa ◽  
Toshiaki Tamamura
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Dry Etching ◽  
Nanometer Pattern
Sign in / Sign up

Export Citation Format

Share Document