Diode laser measurements of CFx species in a low-pressure, high-density plasma reactor

2002 ◽  
Vol 20 (5) ◽  
pp. 1603-1610 ◽  
Author(s):  
M. E. Littau ◽  
M. J. Sowa ◽  
J. L. Cecchi
Keyword(s):  
Diode Laser ◽  
Plasma Reactor ◽  
Low Pressure ◽  
High Density ◽  
Laser Measurements ◽  
Density Plasma

Development of a tubular high-density plasma reactor for water treatment

2006 ◽  
Vol 40 (2) ◽  
pp. 311-322 ◽  
Author(s):  
Derek C. Johnson ◽  
David S. Dandy ◽  
Vasgen A. Shamamian
Keyword(s):  
Water Treatment ◽  
Plasma Reactor ◽  
High Density ◽  
Density Plasma

RF Plasma CVD Using Hollow Cathode Discharge

1988 ◽  
Vol 129 ◽  
Author(s):  
Shin Araki ◽  
Hideki Kamaji ◽  
Kazuo Norimoto
Keyword(s):  
Hollow Cathode ◽  
Low Pressure ◽  
High Density ◽  
Hollow Cathode Discharge ◽  
Rf Plasma ◽  
High Deposition Rate ◽  
Plasma Cvd ◽  
Plasma Damage ◽  
Discharge Electrode ◽  
Density Plasma

ABSTRACTWe have made a-Si photoreceptors at low pressure to prevent the formation of SimHn powders and by separating the growing surface from the high density plasma. A new plasma CVD method using a hollow-cathode discharge, where the discharge electrode is the cathode, is described. There is a hollow region in the discharge electrode. Hollow-cathode discharge enables a high density plasma to form at low pressure. The gas is decomposed in the hollow cathode preventing plasma damage to the film. This method allows us to achieve a high deposition rate (10 µm/h) and good quality films for photoreceptors.

PZT stack etch for MEMS devices in a capacitively coupled high-density plasma reactor

2001 ◽  
Author(s):  
Paul F. Werbaneth ◽  
John Almerico ◽  
Leslie G. Jerde ◽  
Steve Marks
Keyword(s):  
Plasma Reactor ◽  
High Density ◽  
Mems Devices ◽  
Capacitively Coupled ◽  
Density Plasma

PREPARATION OF ULTRA THIN CARBON OVERCOAT FOR MAGNETIC RECORDING MEDIUM BY HOT FILAMENT PLASMA CVD

2002 ◽  
Vol 16 (06n07) ◽  
pp. 973-977 ◽  
Author(s):  
S. FUJIMAKI ◽  
T. OHNO ◽  
Y. KOKAKU ◽  
Y. HONDA
Keyword(s):  
Low Pressure ◽  
High Density ◽  
Thin Coating ◽  
Plasma Cvd ◽  
Hard Carbon ◽  
Carbon Overcoat ◽  
Discharge System ◽  
Hot Filament ◽  
Filament Plasma ◽  
Density Plasma

The deposition process of carbon coating by plasma CVD was studied for the development of a high-density magnetic disk with an ultra thin overcoat of about 4nm thickness. A hot filament discharge system was installed to disk production equipment for the simultaneous deposition of a carbon thin coating on both sides of the disk. The hot filament high-density plasma, in a low-pressure atmosphere of 0.5Pa, was found to be more advantageous, compared with other CVD sources, such as radio frequency plasma, in deposition of the hard carbon thin coating on a negatively biased substrate with ion incidence to the sample. Ion impinging on the substrate was evaluated by calculating its contribution ratio, roughly, from growth rate and bias current density, then examined in relation to the hardness of the carbon thin coatings. In conclusion, hot filament plasma, as a stable CVD source, enables the deposition of the hard carbon overcoat at over 10GPa at the rate of about 1 nm/s, by generating high-density plasma in a low-pressure atmosphere.

scholarly journals Production of Low Pressure and High Density Plasma Using a Single Loop Ribbon Antenna.

Shinku ◽  
1995 ◽  
Vol 38 (3) ◽  
pp. 150-152
Author(s):  
Ken'ichi TAKAGI ◽  
Yukito NAKAGAWA ◽  
Tsutomu TSUKADA
Keyword(s):  
Low Pressure ◽  
High Density ◽  
Single Loop ◽  
Density Plasma
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