Si etching rate calculation for low pressure high density plasma source using Cl[sub 2] gas

2000 ◽  
Vol 18 (5) ◽  
pp. 2224 ◽  
Author(s):  
Young D. Lee ◽  
H. Y. Chang ◽  
C. S. Chang
Keyword(s):  
Etching Rate ◽  
Plasma Source ◽  
Low Pressure ◽  
High Density ◽  
Rate Calculation ◽  
Density Plasma

A Guillemin type E pulse forming network as the driver for a pulsed, high density plasma source

2014 ◽  
Vol 85 (6) ◽  
pp. 063503 ◽  
Author(s):  
Priyavandna J. Rathod ◽  
V. P. Anitha ◽  
Z. H. Sholapurwala ◽  
Y. C. Saxena
Keyword(s):  
Plasma Source ◽  
High Density ◽  
Pulse Forming Network ◽  
Density Plasma

Behavior of Ar plasma formed in a high density plasma source-an ECR reactor

1994 ◽  
Vol 3 (10) ◽  
pp. 746-757 ◽  
Author(s):  
Wu Han-ming ◽  
D. B Graves ◽  
R. K Porteous ◽  
Li Ming
Keyword(s):  
Plasma Source ◽  
High Density ◽  
Ar Plasma ◽  
Density Plasma

Silicon micromachining using a high-density plasma source

2001 ◽  
Vol 34 (18) ◽  
pp. 2769-2774 ◽  
Author(s):  
S A McAuley ◽  
H Ashraf ◽  
L Atabo ◽  
A Chambers ◽  
S Hall ◽  
...  
Keyword(s):  
Plasma Source ◽  
High Density ◽  
Silicon Micromachining ◽  
Density Plasma

Packaging barrier films deposited on PET by PECVD using a new high density plasma source

2005 ◽  
Vol 119 (3) ◽  
pp. 268-273 ◽  
Author(s):  
John Madocks ◽  
Jennifer Rewhinkle ◽  
Loren Barton
Keyword(s):  
Plasma Source ◽  
High Density ◽  
Barrier Films ◽  
Density Plasma

Novel Hollow Cathode Plasma Source with selfsustaining high density plasma

2013 ◽  
Author(s):  
Desmond Gibson ◽  
Ewan Waddall ◽  
david child ◽  
Frank Placido
Keyword(s):  
Hollow Cathode ◽  
Plasma Source ◽  
High Density ◽  
Cathode Plasma ◽  
Density Plasma
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