Characterization of fluoropolymers for 157 nm chemically amplified resist

2001 ◽  
Vol 19 (6) ◽  
pp. 2705 ◽  
Author(s):  
Toshiro Itani ◽  
Minoru Toriumi ◽  
Takuya Naito ◽  
Seiichi Ishikawa ◽  
Seiro Miyoshi ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

Characterization of the effects of base additives on a fullerene chemically amplified resist

2010 ◽  
Author(s):  
Jedsada Manyam ◽  
Mayandithevar Manickam ◽  
Jon A. Preece ◽  
Richard E. Palmer ◽  
Alex P. Robinson
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

Characterization of an acetal-based chemically amplified resist for 257-nm laser mask fabrication

2001 ◽  
Author(s):  
Benjamen M. Rathsack ◽  
Cyrus E. Tabery ◽  
Jeff A. Albelo ◽  
Peter D. Buck ◽  
C. Grant Willson
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Mask Fabrication

scholarly journals Characterization of tBOC based chemically amplified resist for SR lithography.

1997 ◽  
Vol 10 (4) ◽  
pp. 609-612 ◽  
Author(s):  
Teruhiko Kumada ◽  
Hiroshi Adachi ◽  
Hiroshi Watanabe ◽  
Hiroaki Sumitani
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist

scholarly journals Characterization of a non-chemically amplified resist for photomask fabrication using a 257-nm optical pattern generator

1999 ◽  
Author(s):  
Benjamen M. Rathsack ◽  
Cyrus E. Tabery ◽  
Timothy B. Stachowiak ◽  
Tim E. Dallas ◽  
Cheng-Bai Xu ◽  
...  
Keyword(s):  
Pattern Generator ◽  
Chemically Amplified ◽  
Optical Pattern ◽  
Chemically Amplified Resist

Characterization of 193 nm Chemically Amplified Resist during Post Exposure Bake and Post Exposure Delay

1999 ◽  
Vol 38 (Part 1, No. 12B) ◽  
pp. 7094-7098 ◽  
Author(s):  
Eun-Mi Lee ◽  
Moon-Gyu Sung ◽  
Young-Mi Lee ◽  
Young-Soo Sohn ◽  
Hye-Keun Oh
Keyword(s):  
Post Exposure ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Post Exposure Bake ◽  
193 Nm

Chemically amplified resist technology for i-line applications

1998 ◽  
Author(s):  
Medhat A. Toukhy ◽  
Sanjay Malik ◽  
Andrew J. Blakeney ◽  
Karin R. Schlicht
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist
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