Effect of time-varying axial magnetic field on photoresist ashing in an inductively coupled plasma

Author(s):  
Se-Geun Park ◽  
Ho-Young Song ◽  
Beom-hoan O
AIP Advances ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 055209
Author(s):  
Shengwu Zhang ◽  
Yiwen Li ◽  
Wang Ma ◽  
Xiaolong Wei ◽  
Wenyuan Zhang

Volume 3 ◽  
2004 ◽  
Author(s):  
Jaime H. Lozano-Parada ◽  
William B. J. Zimmerman

We consider the development of capacitively and inductively coupled microplasma reactors for detection, control and chemical transformation in microelectromechanical (mems) applications. Current progress in fabrication techniques, including hot embossing, soft and laser lithography is reviewed. Numerical simulations of the interaction of electromagnetic fields with plasma flows in which the plasma flow is at right angles with the electric and magnetic field are analyzed. Two cases in which the electromagnetic fields induce lorentz forces that control the flow are presented. In the first case, the lorentz forces act along the flow direction and produce and increase in the axial pressure that accelerates the flow (micropump configuration). In the second case, the lorentz forces act against the flow by causing a drop in the axial pressure that slows down the flow (microbrake configuration).


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