Influence of gas composition on wafer temperature in a tungsten chemical vapor deposition reactor: Experimental measurements, model development, and parameter identification

Hsiao-Yung Chang; Raymond A. Adomaitis; John N. Kidder; Gary W. Rubloff

doi:10.1116/1.1333076

Influence of gas composition on wafer temperature in a tungsten chemical vapor deposition reactor: Experimental measurements, model development, and parameter identification

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1333076 ◽

2001 ◽

Vol 19 (1) ◽

pp. 230 ◽

Cited By ~ 11

Author(s):

Hsiao-Yung Chang ◽

Raymond A. Adomaitis ◽

John N. Kidder ◽

Gary W. Rubloff

Keyword(s):

Chemical Vapor Deposition ◽

Parameter Identification ◽

Vapor Deposition ◽

Model Development ◽

Chemical Vapor ◽

Experimental Measurements ◽

Gas Composition ◽

Wafer Temperature ◽

Chemical Vapor Deposition Reactor

Download Full-text

Experimental measurements and numerical simulations of the gas composition in a hot‐filament‐assisted diamond chemical‐vapor‐deposition reactor

Journal of Applied Physics ◽

10.1063/1.358525 ◽

1994 ◽

Vol 76 (11) ◽

pp. 7567-7577 ◽

Cited By ~ 44

Author(s):

Mark C. McMaster ◽

Wen L. Hsu ◽

Michael E. Coltrin ◽

David S. Dandy

Keyword(s):

Chemical Vapor Deposition ◽

Numerical Simulations ◽

Vapor Deposition ◽

Chemical Vapor ◽

Experimental Measurements ◽

Gas Composition ◽

Chemical Vapor Deposition Reactor ◽

Hot Filament ◽

Diamond Chemical Vapor Deposition

Download Full-text

Dependence of the gas composition in a microwave plasma-assisted diamond chemical vapor deposition reactor on the inlet carbon source: CH4 versus C2H2

Diamond and Related Materials ◽

10.1016/0925-9635(95)00270-7 ◽

1995 ◽

Vol 4 (7) ◽

pp. 1000-1008 ◽

Cited By ~ 49

Author(s):

Mark C. McMaster ◽

Wen L. Hsu ◽

Michael E. Coltrin ◽

David S. Dandy ◽

Ciaran Fox

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Source ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Gas Composition ◽

Chemical Vapor Deposition Reactor ◽

Diamond Chemical Vapor Deposition

Download Full-text

Theoretical analysis of wafer temperature dynamics in a low pressure chemical vapor deposition reactor

International Journal of Heat and Mass Transfer ◽

10.1016/s0017-9310(99)00069-1 ◽

1999 ◽

Vol 42 (22) ◽

pp. 4131-4142 ◽

Cited By ~ 8

Author(s):

Il-Kyoung Kim ◽

Woo-Seung Kim

Keyword(s):

Chemical Vapor Deposition ◽

Theoretical Analysis ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Wafer Temperature ◽

Chemical Vapor Deposition Reactor ◽

Temperature Dynamics ◽

Pressure Chemical

Download Full-text

Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor

Materials Science Forum ◽

10.4028/www.scientific.net/msf.514-516.475 ◽

2006 ◽

Vol 514-516 ◽

pp. 475-482 ◽

Cited By ~ 1

Author(s):

Pedro Alpuim ◽

M. Ribeiro ◽

Sergej Filonovich

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Flexible Substrates ◽

Hot Wire ◽

Chemical Vapor Deposition Reactor ◽

Deposition Parameters ◽

Thin Silicon

Download Full-text

The Effect of Thermophoresis on Particle Deposition in a Tungsten Low Pressure Chemical Vapor Deposition Reactor

Journal of The Electrochemical Society ◽

10.1149/1.1392026 ◽

1999 ◽

Vol 146 (8) ◽

pp. 2901-2905 ◽

Cited By ~ 4

Author(s):

B. S. MacGibbon ◽

A. A. Busnaina ◽

B. Fardi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Particle Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposition Reactor ◽

Pressure Chemical

Download Full-text

Particle Dynamics in a Chemical Vapor Deposition Reactor: A Multiscale Approach

Industrial & Engineering Chemistry Research ◽

10.1021/ie8015522 ◽

2009 ◽

Vol 48 (13) ◽

pp. 5969-5974 ◽

Cited By ~ 1

Author(s):

Yousef Sharifi ◽

Luke Achenie

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Particle Dynamics ◽

Multiscale Approach ◽

Chemical Vapor Deposition Reactor

Download Full-text

Optimizing the gas phase chemistry in a d.c. arcjet diamond chemical vapor deposition reactor

Thin Solid Films ◽

10.1016/0040-6090(94)90302-6 ◽

1994 ◽

Vol 253 (1-2) ◽

pp. 103-108 ◽

Cited By ~ 4

Author(s):

Scott W. Reeve ◽

Wayne A. Weimer

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Gas Phase Chemistry ◽

Phase Chemistry ◽

Diamond Chemical Vapor Deposition

Download Full-text

DEVELOPMENT OF PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION REACTOR FOR PREPARATION OF OXYGEN CONTAINING ORGANOSILAZANE POLYMER THIN FILMS

NANOCON 2019 Conference Proeedings ◽

10.37904/nanocon.2019.8749 ◽

2020 ◽

Author(s):

Roman PŘIBYL ◽

Štěpánka KELAROVÁ ◽

Vojtěch HOMOLA ◽

Vilma BURŠÍKOVÁ

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polymer Thin Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor

Download Full-text

Kinetics of silicon epitaxy using SiH4in a rapid thermal chemical vapor deposition reactor

Applied Physics Letters ◽

10.1063/1.102719 ◽

1990 ◽

Vol 56 (7) ◽

pp. 629-631 ◽

Cited By ~ 109

Author(s):

M. Liehr ◽

C. M. Greenlief ◽

S. R. Kasi ◽

M. Offenberg

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Reactor ◽

Thermal Chemical Vapor Deposition ◽

Silicon Epitaxy ◽

Kinetics Of

Download Full-text

Temperature optimization in an azimuthally symmetric single‐wafer chemical vapor deposition reactor: The low pressure regime

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577682 ◽

1992 ◽

Vol 10 (4) ◽

pp. 843-849 ◽

Cited By ~ 1

Author(s):

David E. Kotecki ◽

Steven G. Barbee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Chemical Vapor Deposition Reactor ◽

Temperature Optimization ◽

Pressure Regime

Download Full-text