scholarly journals Two-dimensional spatial-phase-locked electron-beam lithography via sparse sampling

Author(s):  
J. T. Hastings ◽  
Feng Zhang ◽  
M. A. Finlayson ◽  
J. G. Goodberlet ◽  
Henry I. Smith
2016 ◽  
Vol 11 (1) ◽  
pp. 88-93
Author(s):  
Dmitriy Utkin ◽  
Aleksandr Shklyaev ◽  
Fedor Dultsev ◽  
Aleksandr Latyshev

Specific aspects of finely focused electron beam interaction with the PMMA-950K resist for the fabrication of closely spaced holes having inhomogeneous spatial distributions are studied. The technological parameters for the creation of two-dimensional photonic crystals with microcavities (missing holes) arrays, which allow obtaining the lateral sizes of the structure within the accuracy better than 2 %, in silicon using electron-beam lithography are determined. Such holes fabrication accuracy is thought to be sufficient to study the interference effects of cavity array radiation in twodimensional photonic crystals.


2002 ◽  
Vol 760 ◽  
Author(s):  
Colin Inglefield ◽  
Royce Anthon

ABSTRACTAn instructional laboratory in two-dimensional diffraction is discussed. The experiment is appropriate for undergraduate students in materials science, solid-state physics (as was the case with our group), modern physics, or optics. The experiment is performed using visible light from a laser incident on a 2D lattice of gold dots deposited with electron beam lithography on a glass substrate. The pattern is microscopic with a lattice constant on the same order of magnitude as the wavelength of light used. Students observe the diffraction pattern, and then quantitatively determine the positions of maxima. These data are used by the students to reconstruct the (real space) microscopic lattice. The students can simulate the experiment with software that computes reciprocal lattice and diffraction patterns for an arbitrary 2D lattice.


2003 ◽  
Vol 93 (12) ◽  
pp. 9943-9946 ◽  
Author(s):  
J. He ◽  
S. H. Tang ◽  
Y. Q. Qin ◽  
P. Dong ◽  
H. Z. Zhang ◽  
...  

2004 ◽  
Vol 36 (1-3) ◽  
pp. 265-270 ◽  
Author(s):  
T. Stomeo ◽  
A. Passaseo ◽  
R. Cingolani ◽  
M. De Vittorio

2006 ◽  
Vol 951 ◽  
Author(s):  
Erin McLellan ◽  
Linda Gunnarsson ◽  
Tomas Rindzevicius ◽  
Mikael Kall ◽  
Shengli Zou ◽  
...  

ABSTRACTNanofabrication is one of the driving forces leading to developments in a variety of fields including microelectronics, medicine, and sensors. Precise control over nanoscale architecture is an essential aspect in relating new size-dependent material properties. Both direct write methods and natural lithography's offer a unique opportunity to fabricate “user-defined” writing of nanostructures in a wide range of materials. Electron Beam Lithography (EBL) and Nanosphere Lithography (NSL) provide the opportunity to fabricate precise nanostructures on a wide variety of substrates with a large range of materials. Using electrodynamics calculations, Schatz and coworkers have discovered one and two dimensional array structures that produce remarkably narrow plasmon resonance spectra upon irradiation with light that is polarized perpendicularly to the array axis. In order to investigate these interactions, precise control of nanoparticle orientation, size, shape and spacing is necessary. If the overall structures have excessive defects then the effect may not be seen. For the two dimensional arrays, to have the best control over array fabrication and to look at these interactions experimentally, EBL was used to construct both hexagonal arrays of circular cylinders and the Kagome lattice. The interparticle spacing in each of these structures was varied systematically. Dark field microscopy was used to look at overall sample homogeneity and collect the single particle plasmon resonance spectrum. Additionally, both dark-field and extinction spectroscopies were used to look at the bulk spectral properties of each array type and each spacing. In investigating of the two dimensional arrays, the Kagome structure was also compared to samples produced by traditional NSL to study the optical interaction of defects, domains, and overall sample uniformity on the shape and location of the plasmon resonance. This work illustrates a deeper understanding in the nature of the optical coupling in nanostructures and this knowledge can be utilized in the future to fabricate designer (tailor made) substrates for plasmonic and surface-enhanced raman applications.


2003 ◽  
Vol 797 ◽  
Author(s):  
Chiang Huen Kang ◽  
Ze Xiang Shen ◽  
Sing Hai Tang

ABSTRACTIn this paper, we present a study on quasi-phase matched (QPM) two-dimensional χ(2) lithium niobate (LN) nonlinear photonic crystal (NPC) for frequency doubling at λ = 1064nm. The NPCs were fabricated by electron beam lithography (EBL) through periodic polarization inversion of the ferroelectric domains and characterized with electrostatic force microscopy (EFM), atomic force microscopy and optical microscopy. Domain inversion occurred through the entire wafer thickness of 0.5mm as EFM images on the +c face of the z-cut wafer showed uniform domain structures throughout the corresponding electron beam irradiated regions of the -c face. In addition, the intended periodicity was observed. Moreover, domain inversion was also seen to have taken place in bulk from the optical images of the chemically etched samples. The EBL technique offers great flexibility in superlattice design and relative ease of fabrication as compared to the conventional poling techniques as pattern transfer is direct without the need for a mask and/or a coating of resist. Besides, micro- or sub-micro scale superlattices corresponding to wavelengths in the visible and into the ultraviolet are highly feasible, restricted only by the transparency of the crystals.


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