Plasmonic and Diffractive Coupling in 2D Arrays of Nanoparticles produced by Electron Beam Lithography

2006 ◽  
Vol 951 ◽  
Author(s):  
Erin McLellan ◽  
Linda Gunnarsson ◽  
Tomas Rindzevicius ◽  
Mikael Kall ◽  
Shengli Zou ◽  
...  

ABSTRACTNanofabrication is one of the driving forces leading to developments in a variety of fields including microelectronics, medicine, and sensors. Precise control over nanoscale architecture is an essential aspect in relating new size-dependent material properties. Both direct write methods and natural lithography's offer a unique opportunity to fabricate “user-defined” writing of nanostructures in a wide range of materials. Electron Beam Lithography (EBL) and Nanosphere Lithography (NSL) provide the opportunity to fabricate precise nanostructures on a wide variety of substrates with a large range of materials. Using electrodynamics calculations, Schatz and coworkers have discovered one and two dimensional array structures that produce remarkably narrow plasmon resonance spectra upon irradiation with light that is polarized perpendicularly to the array axis. In order to investigate these interactions, precise control of nanoparticle orientation, size, shape and spacing is necessary. If the overall structures have excessive defects then the effect may not be seen. For the two dimensional arrays, to have the best control over array fabrication and to look at these interactions experimentally, EBL was used to construct both hexagonal arrays of circular cylinders and the Kagome lattice. The interparticle spacing in each of these structures was varied systematically. Dark field microscopy was used to look at overall sample homogeneity and collect the single particle plasmon resonance spectrum. Additionally, both dark-field and extinction spectroscopies were used to look at the bulk spectral properties of each array type and each spacing. In investigating of the two dimensional arrays, the Kagome structure was also compared to samples produced by traditional NSL to study the optical interaction of defects, domains, and overall sample uniformity on the shape and location of the plasmon resonance. This work illustrates a deeper understanding in the nature of the optical coupling in nanostructures and this knowledge can be utilized in the future to fabricate designer (tailor made) substrates for plasmonic and surface-enhanced raman applications.

2005 ◽  
Vol 872 ◽  
Author(s):  
Erin M. Hicks ◽  
Linda Gunnarrsson ◽  
Tomas Rindevicius ◽  
Shengli Zou ◽  
Bengt Kasemo ◽  
...  

AbstractThe improvement of nanofabrication is one of the driving forces behind advancements in the fields of electronics, photonics and sensors. Precise control over nanoscale architecture is an essential aspect in relating new size-dependent material properties. Direct writing methods such as Electron Beam Lithography (EBL), enable precise “user-defined” writing of nanostructures in a wide range of materials. Using electrodynamics calculations, Schatz and coworkers have discovered one dimensional array structures built from spherical silver nanoparticles that produce remarkably narrow plasmon resonance spectra upon irradiation with light that is polarized perpendicularly to the array axis. In order to investigate these interactions, precise control of nanoparticle orientation, size, shape and spacing is necessary. If the overall structures have excessive defects then the effect may not be seen. To have the best control over array fabrication and to look at these interactions experimentally, EBL was used to construct lines of circular cylinders of varying interparticle spacings. Dark field microscopy was used to look at overall sample homogeneity and collect the single particle plasmon resonance spectrum. Additionally, a UV-visible spectrometer with a variable angle stage was used to look at the bulk line properties. With experimental verification of the theory will lead to not only a more thorough understanding of the underlying principles of nanophotonics, but also application in biosensing, that potentially improve on current technologies.


2016 ◽  
Vol 11 (1) ◽  
pp. 88-93
Author(s):  
Dmitriy Utkin ◽  
Aleksandr Shklyaev ◽  
Fedor Dultsev ◽  
Aleksandr Latyshev

Specific aspects of finely focused electron beam interaction with the PMMA-950K resist for the fabrication of closely spaced holes having inhomogeneous spatial distributions are studied. The technological parameters for the creation of two-dimensional photonic crystals with microcavities (missing holes) arrays, which allow obtaining the lateral sizes of the structure within the accuracy better than 2 %, in silicon using electron-beam lithography are determined. Such holes fabrication accuracy is thought to be sufficient to study the interference effects of cavity array radiation in twodimensional photonic crystals.


2002 ◽  
Vol 760 ◽  
Author(s):  
Colin Inglefield ◽  
Royce Anthon

ABSTRACTAn instructional laboratory in two-dimensional diffraction is discussed. The experiment is appropriate for undergraduate students in materials science, solid-state physics (as was the case with our group), modern physics, or optics. The experiment is performed using visible light from a laser incident on a 2D lattice of gold dots deposited with electron beam lithography on a glass substrate. The pattern is microscopic with a lattice constant on the same order of magnitude as the wavelength of light used. Students observe the diffraction pattern, and then quantitatively determine the positions of maxima. These data are used by the students to reconstruct the (real space) microscopic lattice. The students can simulate the experiment with software that computes reciprocal lattice and diffraction patterns for an arbitrary 2D lattice.


2003 ◽  
Vol 93 (12) ◽  
pp. 9943-9946 ◽  
Author(s):  
J. He ◽  
S. H. Tang ◽  
Y. Q. Qin ◽  
P. Dong ◽  
H. Z. Zhang ◽  
...  

2004 ◽  
Vol 36 (1-3) ◽  
pp. 265-270 ◽  
Author(s):  
T. Stomeo ◽  
A. Passaseo ◽  
R. Cingolani ◽  
M. De Vittorio

1999 ◽  
Vol 06 (05) ◽  
pp. 585-590 ◽  
Author(s):  
SUSUMU SHIRAKI ◽  
HIDESHI ISHII ◽  
YOSHIMASA NIHEI ◽  
MASANORI OWARI

A 180° deflection toroidal analyzer is a novel electron spectrometer, which allows the simultaneous registration of the wide range of polar angles in a given azimuth of the sample. Therefore, measurements of photo- and Auger electron intensities over π steradians can be performed rapidly by azimuthal rotation of the sample. Using this analyzer, two-dimensional patterns of electron-beam-excited O KVV and Mg KVV Auger electron diffraction (AED) from a MgO(001) surface were measured in short acquisition times. The AED patterns obtained were compared with theoretical ones calculated by the multiple-scattering scheme. The agreement between experimental and theoretical data was good for both O KVV and Mg KVV transitions.


1994 ◽  
Vol 23 (1-4) ◽  
pp. 81-84 ◽  
Author(s):  
B.H. Koek ◽  
T. Chisholm ◽  
A.J. v. Run ◽  
J. Romijn ◽  
J.P. Davey

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