Effects of increasing nitrogen concentration on the structure of carbon nitride films deposited by ion beam assisted deposition

2000 ◽  
Vol 18 (5) ◽  
pp. 2277 ◽  
Author(s):  
P. Hammer ◽  
N. M. Victoria ◽  
F. Alvarez
Keyword(s):  
Carbon Nitride ◽  
Ion Beam ◽  
Nitrogen Concentration ◽  
Ion Beam Assisted Deposition

Structural properties of amorphous carbon nitride films prepared by ion beam assisted deposition

2004 ◽  
Vol 338-340 ◽  
pp. 486-489 ◽  
Author(s):  
A.S. Ferlauto ◽  
A. Champi ◽  
C.A. Figueroa ◽  
C.T.M. Ribeiro ◽  
F.C. Marques ◽  
...  
Keyword(s):  
Structural Properties ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition ◽  
Amorphous Carbon Nitride

scholarly journals Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition

2006 ◽  
Vol 17 (6) ◽  
pp. 1163-1169 ◽  
Author(s):  
Wilmer Sucasaire ◽  
Masao Matsuoka ◽  
Karina C. Lopes ◽  
Juan C. R. Mittani ◽  
Luis H. Avanci ◽  
...  
Keyword(s):  
Infrared Spectroscopy ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition ◽  
Raman And Infrared Spectroscopy ◽  
Spectroscopy Studies

Carbon Nitride Formation by Plasma Assisted Ion Beam Deposition

1995 ◽  
Vol 396 ◽  
Author(s):  
G.S. Tompa ◽  
I.H. Murzin ◽  
S.I. Kim ◽  
Y.O Ahn ◽  
B. Gallois ◽  
...  
Keyword(s):  
Beam Energy ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Nitrogen Concentration ◽  
Plasma Source ◽  
Diagnostic Techniques ◽  
Rf Plasma ◽  
Ion Beam Deposition ◽  
Optical And Mechanical Properties ◽  
Beam Deposition

AbstractTheoretical works have indicated that carbon nitride, in a β-C4N4 phase, would have optical and mechanical properties comparable to or exceeding those of diamond. In this effort, the formation of carbon nitride thin films was investigated using a Plasma Assisted Ion Beam Deposition (PAIBD). In this technique, a C- ion beam combined with a N2 or NH3 RF plasma source is used to synthesize carbon nitride films. These films were investigated as a function of both C- ion beam energy and the power of the plasma source. The C- ion energy was found to be a key parameter in the formation of carbon nitride. The films were evaluated by a variety of diagnostic techniques including Raman, AES, XRD and FTIR. Analysis confirms high nitrogen concentration in the synthesized films and the major portion of carbon being single bonds in the sp3 bond configuration, which is a characteristic of the tetrahedral -C3N4 phase. Tribology tests confirmed that the friction coefficient and the wear rate are comparable to diamond. The results show that the higher C- ion beam energy (-150 eV) forms insulating films with the highest single bond percentages in the range studied. We believe beam energy control is critical to the types of bonds formed.

Trapping of Hydrogen in Carbon Nitride Films During or After High Temperature Heat Treatment

2004 ◽  
Vol 854 ◽  
Author(s):  
David C. Ingram ◽  
Asghar Kayani ◽  
William C. Lanter ◽  
Charles A. DeJoseph
Keyword(s):  
Heat Treatment ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Deuterated Water ◽  
Elastic Recoil ◽  
High Temperature Heat Treatment ◽  
Ion Beam Assisted Deposition ◽  
Ultra High Purity ◽  
Magnetron Sputter Deposition ◽  
Deuterium Gas

ABSTRACTThin films of carbon nitride deposited by ion beam assisted deposition or by magnetron sputter deposition typically contain a significant fraction of hydrogen, 1–30 atomic percent (at.%). In order to improve the thermal stability of the properties of the films, attempts have been made to minimize the hydrogen trapped during deposition. Such films typically have less than 5 at.% hydrogen. On heating these films in ultra high purity (99.999%) argon, it has been found that above 600°C they start to absorb significant amounts of hydrogen, this despite retaining their mechanical integrity. The composition of the films is determined using Rutherford Backscattering Spectroscopy in combination with Elastic Recoil Spectroscopy for detecting the hydrogen isotopes. In this paper, the possible sources of the hydrogen have been investigated by exposing the samples to deuterated water or deuterium gas during or immediately after the heat treatment.

Preparation of carbon nitride thin films by ion beam assisted deposition and their mechanical properties

1997 ◽  
Vol 308-309 ◽  
pp. 239-244 ◽  
Author(s):  
M Kohzaki ◽  
A Matsumuro ◽  
T Hayashi ◽  
M Muramatsu ◽  
K Yamaguchi
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition

Investigation of titanium nitride films prepared by ion-beam-assisted deposition at high Ar+/Ti ratio

1992 ◽  
Vol 268 ◽  
Author(s):  
J. H. Hsieh ◽  
D. E. Bush ◽  
R. A. Erck ◽  
G. R. Fenske ◽  
F. A. Nichols
Keyword(s):  
Titanium Nitride ◽  
Partial Pressure ◽  
Ion Beam ◽  
Nitrogen Concentration ◽  
Preferred Orientation ◽  
Nitrogen Partial Pressure ◽  
Ion Beam Assisted Deposition ◽  
Reduced Nitrogen ◽  
Low Nitrogen

ABSTRACTTitanium nitride films were prepared by reactive ion beam assisted deposition (RIBAD) with Ar+/Ti ratios ranging from 1.0 to 2.3. The compositions, phases and textures of these films were studied by AES and XRD as a function of Ar+/Ti ratio and nitrogen partial pressure. The results indicate that the IBAD titanium nitride films deposited at high Ar+/Ti ratio and low nitrogen partial pressure may have reduced nitrogen concentration, (200) preferred orientation, and possibly contain the Ti2N phase.

scholarly journals Influence of Ar Ion Addition on Synthesis of Carbon Nitride Films by Ion-Beam-Assisted Deposition.

1998 ◽  
Vol 64 (1) ◽  
pp. 152-156
Author(s):  
Masao KOKLAKI ◽  
Akihito MATSUMURO ◽  
Mutsuo MURAMATSU ◽  
Toshiyuki HAYASHI ◽  
Katsumi YAMAGUCHI
Keyword(s):  
Carbon Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition

Influence of Deposition Temperatures on Bonding State and Microstructure of Carbon Nitride Thin Films Prepared by Ion-Beam-Assisted Deposition

1997 ◽  
Vol 36 (Part 1, No. 4A) ◽  
pp. 2313-2318 ◽  
Author(s):  
Masao Kohzaki ◽  
Akihito Matsumuro ◽  
Toshiyuki Hayashi ◽  
Mutsuo Muramatsu ◽  
Katsumi Yamaguchi
Keyword(s):  
Thin Films ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Bonding State ◽  
Ion Beam Assisted Deposition

Ar Ion Effect on Mechanical Properties of Carbon Nitride Films Prepared by Ion-Beam-Assisted Deposition

2002 ◽  
Vol 41 (Part 1, No. 12) ◽  
pp. 7455-7461 ◽  
Author(s):  
Hidenobu Ohta ◽  
Akihito Matsumuro ◽  
Yutaka Takahashi
Keyword(s):  
Mechanical Properties ◽  
Carbon Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition
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