Correlation Between the Mechanical Strength and Curing Condition of No-Flow Flip Chip Assemblies

2002 ◽  
Vol 124 (4) ◽  
pp. 397-402 ◽  
Author(s):  
C. W. Tang ◽  
Y. C. Chan ◽  
K. C. Hung ◽  
P. L. Tu
Keyword(s):  
Mechanical Strength ◽  
High Performance ◽  
Flip Chip ◽  
Low Cost ◽  
Under Bump Metallization ◽  
Assembly Technique ◽  
Curing Condition ◽  
Flip Chip Assembly ◽  
Relationship Of ◽  
Interconnect Technology

Flip chip is the emerging interconnect technology for the next generation of high performance electronics. To eliminate the process bottlenecks associated with flip chip assembly, a new assembly technique based around “No-flow” underfill formulations has been proposed. In this paper, we have studied the correlation between the mechanical strength and the curing condition of no-flow flip chip assemblies using six different reflow profiles. It is found that both Ni3Sn4 and Cu6Sn5 intermetallics (IMCs) are formed at the solder/substrate pad and UBM (Under Bump Metallization)/solder interfaces respectively. The thickness of both IMCs increase with the increasing heating factor. The characteristics of the mechanical strength of these IMCs have been demonstrated. A correlation between the mechanical strength and the interfacial metallurgical reaction has been discussed. Also, the fastest possible reflow profile for both the cure of the underfill and maximizing the shear strength is identified. Based on the observed relationship of the mechanical strength and underfill curing of no-flow flip chip assemblies with Qn, the reflow profile should be controlled with caution in order to optimize both the mechanical strength and time for underfill cure. Only a clearer understanding of these correlation can allow manufacturers to develop a optimal, high reliable, low cost, high throughput no-flow flip chip assembly process.

Understanding Mold Compound Behavior on Flip Chip QFN Packages

2018 ◽  
Vol 2018 (1) ◽  
pp. 000125-000128
Author(s):  
Ruby Ann M. Camenforte ◽  
Jason Colte ◽  
Richard Sumalinog ◽  
Sylvester Sanchez ◽  
Jaimal Williamson
Keyword(s):  
Thermal Performance ◽  
High Performance ◽  
Flip Chip ◽  
Low Cost ◽  
Semiconductor Industry ◽  
Gelation Time ◽  
Molding Process ◽  
Design Quality ◽  
Low Resistance ◽  
Die Attach

Abstract Overmolded Flip Chip Quad Flat No-lead (FCQFN) is a low cost flip chip on leadframe package where there is no need for underfill, and is compatible with Pb free or high Pb metallurgy. A robust leadframe design, quality solder joint formation and an excellent molding process are three factors needed to assemble a high performance FCQFN. It combines the best of both wirebonded QFN and wafer chip scale devices. For example, wafer chip scale has low resistance, but inadequate thermal performance (due to absence of thermal pad), whereas wirebonded QFN has good thermal performance (i.e., heat dissipated through conductive die attach material, through the pad and to the board) but higher resistance. Flip chip QFN combines both positive aspects – that is: low resistance and good thermals. One of the common defects for molded packages across the semiconductor industry is the occurrence of mold voiding as this can potentially affect the performance of a device. This paper will discuss how mold voiding is mitigated by understanding the mold compound behavior on flip chip QFN packages. Taking for example the turbulent mold flow observed on flip chip QFN causing mold voids. Mold compound material itself has a great contribution to mold voids, hence defining the correct attributes of the mold compound is critical. Altering the mold compound property to decrease the mold compound rheology is a key factor. This dynamic interaction between mold compound and flip chip QFN package configuration is the basis for a series of design of experiments using a full factorial matrix. Key investigation points are establishing balance in mold compound chemistry allowing flow between bump pitch, as well as the mold compound rheology, where gelation time has to be properly computed to allow flow across the leadframe. Understanding the flow-ability of mold compound for FCQFN, the speed of flow was optimized to check on its impact on mold voids. Mold airflow optimization is also needed to help fill in tighter bump spacing but vacuum-on time needs to be optimized as well.

New Stacked Die Interconnect Technology for High-Performance and Low-Cost FPGA

2015 ◽  
Vol 12 (3) ◽  
pp. 111-117
Author(s):  
Woon-Seong Kwon ◽  
Suresh Ramalingam ◽  
Xin Wu ◽  
Liam Madden ◽  
C. Y. Huang ◽  
...  
Keyword(s):  
High Performance ◽  
Flip Chip ◽  
Process Integration ◽  
Cost Effective ◽  
Design Rule ◽  
Innovative Technology ◽  
Wind Condition ◽  
Wafer Level ◽  
Effective Manner ◽  
Interconnect Technology

This article introduces the first comprehensive demonstration of new innovative technology comprising multiple key technologies for highly cost-effective and high-performance Xilinx field programmable gate array (FPGA), which is so-called stack silicon-less interconnect technology (SLIT) that provides the equivalent high-bandwidth connectivity and routing design-rule as stack silicon interconnect (SSI) technology at a cost-effective manner. We have successfully demonstrated the overall process integration and functions of our new SLIT-employed package using Virtex®-7 2000T FPGA product with chip-to-wafer stacking, wafer-level flux cleaning, microbump underfilling, mold encapsulation, and backside silicon removal. Of all technology elements, both full silicon removal process with faster etching and no dielectric layer damage and wafer warpage management after full silicon etching are most crucial elements to realize the SLIT technology. To manage the wafer warpage after full Si removal, a couple of knobs are identified and used such as top reinforcement layer, microbump underfill properties tuning, die thickness, die-to-die space, and total thickness adjustments. It is also discussed in the article how the wafer warpage behaves and how the wafer warpage is managed. New SLIT module shows excellent warpage characteristics of only −30 μm ∼ −40 μm at room temperature (25°C) for 25 mm × 31 mm in size and +20 μm ∼ +25 μm at reflow temperature (250°C). Thermal simulation results shows that thermal resistance of new SLIT package is almost comparable to that of standard 2000T flip-chip ball grid array (FC-BGA) package using through silicon via interposer with standard heat sink configuration and air wind condition. The reliability assessment is now under the study.

Wafer Level Assembly Technique Development for Fine Pitch Flip Chip 3D Die-to-Wafer Integration

2010 ◽  
Vol 2010 (1) ◽  
pp. 000548-000553
Author(s):  
Zhaozhi Li ◽  
Brian J. Lewis ◽  
Paul N. Houston ◽  
Daniel F. Baldwin ◽  
Eugene A. Stout ◽  
...  
Keyword(s):  
Flip Chip ◽  
Low Cost ◽  
Three Dimensional ◽  
Cost Effective ◽  
Market Demand ◽  
Wafer Level ◽  
Packaging Technology ◽  
Fine Pitch ◽  
3D Packaging ◽  
Assembly Technique

Three Dimensional (3D) Packaging has become an industry obsession as the market demand continues to grow toward higher packaging densities and smaller form factor. In the meanwhile, the 3D die-to-wafer (D2W) packaging structure is gaining popularity due to its high manufacturing throughput and low cost per package. In this paper, the development of the assembly process for a 3D die-to-wafer packaging technology, that leverages the wafer level assembly technique and flip chip process, is introduced. Research efforts were focused on the high-density flip chip wafer level assembly techniques, as well as the challenges, innovations and solutions associated with this type of 3D packaging technology. Processing challenges and innovations addressed include flip chip fluxing methods for very fine-pitch and small bump sizes; wafer level flip chip assembly program creation and yield improvements; and set up of the Pb-free reflow profile for the assembled wafer. 100% yield was achieved on the test vehicle wafer that has totally 1,876 flip chip dies assembled on it. This work has demonstrated that the flip chip 3D die-to-wafer packaging architecture can be processed with robust yield and high manufacturing throughput, and thus to be a cost effective, rapid time to market alternative to emerging 3D wafer level integration methodologies.

Next-Generation Copper, Nickel and Lead-Free Metallization Products for Next-Generation Devices and Applications

2015 ◽  
Vol 2015 (DPC) ◽  
pp. 000611-000638
Author(s):  
Jonathan Prange ◽  
Yi Qin ◽  
Matthew Thorseth ◽  
Inho Lee ◽  
Masaaki Imanari ◽  
...  
Keyword(s):  
High Performance ◽  
Flip Chip ◽  
Low Cost ◽  
Lead Free ◽  
Lead Free Solder ◽  
Next Generation ◽  
Copper Nickel ◽  
Microelectronic Devices ◽  
Architectural Features ◽  
Free Solder

Flip-chip interconnect and 3-D packaging applications must utilize reliable, high-performance metallization products in order to produce highly-efficient, low-cost microelectronic devices. As the market moves to shrinking device architectural features and increasingly difficult pattern layouts, more demand is placed on the plating performance of the copper, nickel and lead-free solder products used to create these interconnects. Additionally, the move from traditional C4 bumping processes with lead-free solder to capping processes utilizing copper pillars with lead-free solder requires metal interfaces that are highly compatible in order to avoid defects that could occur. In this paper, next-generation products developed for copper pillar, nickel barrier, and lead-free solder plating will be introduced that are capable of delivering high-performance and highly reliable metallic interconnects. The additive packages that were selected and optimized allowing for increased rate of electrodeposition, uniform height control with controllable pillar shape and smooth surface morphology will be discussed. Furthermore, compatibility will be shown for a lead-free solder cap electrodeposited onto copper pillar structures, both with and without nickel barrier layers, on large pore features (≥50 μm diameter) and micro pore features (≤20 μm diameter) for both bumping and capping applications.

Flip-Chip Assembly of RF MEMS for Microwave Hybrid Circuitry

2005 ◽  
Author(s):  
Daniel J. Hyman ◽  
Roger Kuroda
Keyword(s):  
High Performance ◽  
Flip Chip ◽  
Rf Mems ◽  
Phase Shifters ◽  
Lessons Learned ◽  
High Yield ◽  
Pure Gold ◽  
Mems Devices ◽  
Large Area ◽  
Flip Chip Assembly

XCom Wireless is a small business specializing in RF MEMS-enabled tunable filters and phase shifters for next-generation communications systems. XCom has developed a high-yielding flip-chip assembly and packaging technique for implementing RF MEMS devices into fully-packaged chip-scale hybrid integrated circuitry for radio and microwave frequency applications through 25 GHz. This paper discusses the packaging approach employed, performance and reliability aspects, and lessons learned. The packaging is similar to a hybrid module approach, with discrete RF MEMS component dies flip-chipped into larger packages containing large-area integrated passives. The first level of interconnect is a pure gold flip chip for high yield strength and reliability with small dies. The use of first-level flip-chip and second-level BGAs allows the extremely large bandwidth MEMS devices to maintain high performance characteristics.

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