In-Plane Gravity Loading of a Circular Membrane

2000 ◽  
Vol 67 (4) ◽  
pp. 837-839 ◽  
Author(s):  
R. O. Tejeda ◽  
E. G. Lovell ◽  
R. L. Engelstad
Keyword(s):  
Displacement Field ◽  
Ion Beam ◽  
Stress And Strain ◽  
Circular Membrane ◽  
Next Generation ◽  
Projection Lithography ◽  
Beam Projection ◽  
Lithographic Masks

This paper develops the displacement field for a circular membrane which is statically loaded by gravity acting in its plane. Coupled to the displacements are the stress and strain distributions. The solution is applicable to the modeling of next generation lithographic masks, ion-beam projection lithography masks in particular. [S0021-8936(00)00803-5]

Multicusp sources for ion beam projection lithography

1998 ◽  
Vol 69 (2) ◽  
pp. 877-879 ◽  
Author(s):  
Y. Lee ◽  
R. A. Gough ◽  
W. B. Kunkel ◽  
K. N. Leung ◽  
J. Vujic ◽  
...  
Keyword(s):  
Ion Beam ◽  
Projection Lithography ◽  
Beam Projection

Stress relief structures for ion-beam projection lithography masks

1999 ◽  
Vol 46 (1-4) ◽  
pp. 481-484 ◽  
Author(s):  
R. Tejeda ◽  
R. Engelstad ◽  
E. Lovell ◽  
E. Haugeneder ◽  
H. Löschner
Keyword(s):  
Ion Beam ◽  
Stress Relief ◽  
Projection Lithography ◽  
Beam Projection

Simulation of latent image formation for ion beam projection lithography

2001 ◽  
Vol 57-58 ◽  
pp. 335-342 ◽  
Author(s):  
G. Mladenov ◽  
K. Vutova ◽  
I. Raptis ◽  
P. Argitis ◽  
I. Rangelow
Keyword(s):  
Ion Beam ◽  
Image Formation ◽  
Latent Image ◽  
Projection Lithography ◽  
Beam Projection

Development of data conversion system for electron beam projection lithography

2002 ◽  
Vol 20 (6) ◽  
pp. 2672 ◽  
Author(s):  
Kokoro Kato ◽  
Kuninori Nishizawa ◽  
Tamae Haruki ◽  
Tadao Inoue ◽  
Koichi Kamijo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Data Conversion ◽  
Projection Lithography ◽  
Conversion System ◽  
Beam Projection

Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning

2011 ◽  
Vol 21 (4) ◽  
pp. 045038 ◽  
Author(s):  
Stefan Eder Kapl ◽  
Hans Loeschner ◽  
Walter Piller ◽  
Martin Witt ◽  
Wolfgang Pilz ◽  
...  
Keyword(s):  
Projection Lithography ◽  
Beam Projection

scholarly journals Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect

2019 ◽  
Vol 8 (3-4) ◽  
pp. 233-240
Author(s):  
Roberto Fallica
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Three Dimensional ◽  
Talbot Effect ◽  
Large Area ◽  
Projection Lithography ◽  
Main Technique ◽  
Direct Laser ◽  
The Cost ◽  
Diffraction Effects

Abstract There are a growing number of applications where three-dimensional patterning is needed for the fabrication of micro- and nanostructures. Thus far, grayscale lithography is the main technique for obtaining a thickness gradient in a resist material that is exploited for pattern transfer by anisotropic etch. However, truly three-dimensional structures can only be produced by unconventional lithography methods such as direct laser writing, focused ion beam electrodeposition, colloidal sphere lithography, and tilted multiple-pass projection lithography, but at the cost of remarkable complexity and lengthiness. In this work, the three-dimensional shape of light, which is formed by Talbot effect diffraction, was exploited to produce inherently three-dimensional patterns in a photosensitive polymer. Using light in the soft X-ray wavelength, periodic three-dimensional structures of lateral period 600 nm were obtained. The position at which the sample has to be located to be in the Fresnel regime was simulated using an analytical implementation of the Fresnel integrals approach. Exploiting the light shape forming in diffraction effects thus enables the patterning of high-resolution three-dimensional nanostructures over a large area and with a single exposure pass – which would be otherwise impossible with conventional lithographic methods.

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