Reactive-Environment Hollow Cathode Sputtering: Compound Film Production, and Application to Thin Film Photovoltaics

Author(s):  
Alan Delahoy ◽  
Sheyu Guo ◽  
John Cambridge ◽  
Rob Lyndall ◽  
J.A. Selvan ◽  
...  
2013 ◽  
Vol 549 ◽  
pp. 184-191 ◽  
Author(s):  
Z. Hubička ◽  
Š. Kment ◽  
J. Olejníček ◽  
M. Čada ◽  
T. Kubart ◽  
...  

2001 ◽  
Vol 11 (1) ◽  
pp. 3844-3847
Author(s):  
Jeong-Dae Suh ◽  
Seok Kil Han ◽  
Kwang Yong Kang ◽  
Min Hwan Kwak

2011 ◽  
Vol 1323 ◽  
Author(s):  
Alan E. Delahoy ◽  
Kai Jansen ◽  
Chris Robinson ◽  
Anthony Varvar ◽  
Paul Fabiano ◽  
...  

ABSTRACTThis paper reviews the status of hollow cathode sputtering as an evolving technology for production of thin-film transparent conducting oxides for PV applications. A large market segment for PV TCOs is represented by thin-film a-Si:H and tandem a-Si:H/nc-Si:H modules. For superstrate devices, textured SnO2:F produced on-line by APCVD is currently the market leader, although alternative off-line methods and materials are now emerging. In particular, zinc oxide can be produced by LPCVD, APCVD, magnetron sputtering, and hollow cathode sputtering (HCS). HCS is a stable process featuring low-cost metal targets and a soft deposition process. We discuss the deposition principles and the film results obtained using linear hollow cathodes 0.5 m and 1.0 m in length. We report the direct deposition of highly textured doped ZnO having an electron mobility in excess of 50 cm2/Vs. The production cost of textured ZnO is estimated for several competing techniques.


2010 ◽  
Author(s):  
O. El Daif ◽  
E. Drouard ◽  
G. Gomard ◽  
X. Meng ◽  
A. Kaminski ◽  
...  

2015 ◽  
Vol 107 (14) ◽  
pp. 143902 ◽  
Author(s):  
Liang Wang ◽  
Miao Luo ◽  
Sikai Qin ◽  
Xinsheng Liu ◽  
Jie Chen ◽  
...  

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