Growth of large area YBa/sub 2/Cu/sub 3/O/sub 7-x/ thin film by cylindrical hollow cathode sputtering

2001 ◽  
Vol 11 (1) ◽  
pp. 3844-3847
Author(s):  
Jeong-Dae Suh ◽  
Seok Kil Han ◽  
Kwang Yong Kang ◽  
Min Hwan Kwak
Keyword(s):  
Thin Film ◽  
Hollow Cathode ◽  
Large Area ◽  
Cathode Sputtering ◽  
Cylindrical Hollow Cathode

Finite Element Simulation on the Distribution of Discharge Gas in Hollow Cathode Plasma

2016 ◽  
Vol 693 ◽  
pp. 1054-1060
Author(s):  
Yi Fang Wen ◽  
Yan Nian Rui ◽  
Hong Wei Wang
Keyword(s):  
Thin Film ◽  
Finite Element ◽  
Surface Modification ◽  
Hollow Cathode ◽  
Fluid Distribution ◽  
Large Area ◽  
Cathode Plasma ◽  
Plasma Surface Modification ◽  
Plasma Surface ◽  
Discharge Gas

The graft polymerization in radio frequency hollow cathode plasma (RFHCP) is suitable for the surface modification of large-area thin film materials. The homogeneity of plasma surface modification of large-area thin film materials has always been paid close attention, and it is also the key factor affecting the industrialized applications of the technique. However, the homogeneity of plasma surface modification is thought to depend greatly on the distribution of discharge gas. In this paper, a finite element model is proposed to discuss the flow of discharge gas in hollow cathode plasma. The concentration distribution of the discharge gas has been discussed by the combination of numerical simulation of fluid distribution and pipe flow theory based on the investigation of the transport property of gas under vacuum. Comparisons between available experiments have also been performed to validate the applicability and practicability of the proposed model.

Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system

2013 ◽  
Vol 549 ◽  
pp. 184-191 ◽  
Author(s):  
Z. Hubička ◽  
Š. Kment ◽  
J. Olejníček ◽  
M. Čada ◽  
T. Kubart ◽  
...  
Keyword(s):  
Thin Film ◽  
Hollow Cathode ◽  
Cathode Sputtering ◽  
Hematite Fe2o3 ◽  
Fe2o3 Thin Film ◽  
Sputtering System ◽  
Pulsed Magnetron

Hollow cathode discharge sputtering device for uniform large area thin film deposition

1991 ◽  
Vol 9 (4) ◽  
pp. 2374-2377 ◽  
Author(s):  
H. Koch ◽  
L. J. Friedrich ◽  
V. Hinkel ◽  
F. Ludwig ◽  
B. Politt ◽  
...  
Keyword(s):  
Thin Film ◽  
Hollow Cathode ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Hollow Cathode Discharge ◽  
Large Area

Large area deposition of YBaCuO thin films by means of hollow cathode sputtering

1993 ◽  
Vol 195 ◽  
pp. 267-269 ◽  
Author(s):  
H.-U. Müller ◽  
J.-P. Müller ◽  
F. Ludwig ◽  
G. Ehlers
Keyword(s):  
Thin Films ◽  
Hollow Cathode ◽  
Large Area ◽  
Cathode Sputtering ◽  
Area Deposition

Large-area YBCO thin film deposition using linear hollow cathode discharge sputtering

1996 ◽  
Vol 262 (1-2) ◽  
pp. 89-97 ◽  
Author(s):  
Th. Schurig ◽  
S. Menkel ◽  
Z. Quan ◽  
J. Beyer ◽  
B. Güttler ◽  
...  
Keyword(s):  
Thin Film ◽  
Hollow Cathode ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Hollow Cathode Discharge ◽  
Ybco Thin Film ◽  
Large Area

Large-Scale Deposition of Transparent Conducting Oxides by Hollow Cathode Sputtering

2011 ◽  
Vol 1323 ◽  
Author(s):  
Alan E. Delahoy ◽  
Kai Jansen ◽  
Chris Robinson ◽  
Anthony Varvar ◽  
Paul Fabiano ◽  
...  
Keyword(s):  
Thin Film ◽  
Hollow Cathode ◽  
Large Scale ◽  
Low Cost ◽  
Stable Process ◽  
Transparent Conducting Oxides ◽  
Deposition Process ◽  
Cathode Sputtering ◽  
Conducting Oxides ◽  
Transparent Conducting

ABSTRACTThis paper reviews the status of hollow cathode sputtering as an evolving technology for production of thin-film transparent conducting oxides for PV applications. A large market segment for PV TCOs is represented by thin-film a-Si:H and tandem a-Si:H/nc-Si:H modules. For superstrate devices, textured SnO2:F produced on-line by APCVD is currently the market leader, although alternative off-line methods and materials are now emerging. In particular, zinc oxide can be produced by LPCVD, APCVD, magnetron sputtering, and hollow cathode sputtering (HCS). HCS is a stable process featuring low-cost metal targets and a soft deposition process. We discuss the deposition principles and the film results obtained using linear hollow cathodes 0.5 m and 1.0 m in length. We report the direct deposition of highly textured doped ZnO having an electron mobility in excess of 50 cm2/Vs. The production cost of textured ZnO is estimated for several competing techniques.

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