MEMS Fabrication Course for Pressure Sensors, Flow Sensors, Fluidic Channels and Micro-Pumps

2008 ◽  
Author(s):  
Robert E. Pearson ◽  
Lynn F. Fuller ◽  
Ivan Puchades
Keyword(s):  
Pressure Sensors ◽  
Flow Sensors ◽  
Mems Fabrication

scholarly journals Cavity-BOX SOI: Advanced Silicon Substrate with Pre-Patterned BOX for Monolithic MEMS Fabrication

Micromachines ◽  
2021 ◽  
Vol 12 (4) ◽  
pp. 414
Author(s):  
Marta Maria Kluba ◽  
Jian Li ◽  
Katja Parkkinen ◽  
Marcus Louwerse ◽  
Jaap Snijder ◽  
...  
Keyword(s):  
Complex Geometry ◽  
Pressure Sensors ◽  
Silicon On Insulator ◽  
Test Case ◽  
Mems Devices ◽  
Device Layer ◽  
Mems Fabrication ◽  
Silicon Islands ◽  
Design Freedom ◽  
Deep Brain

Several Silicon on Insulator (SOI) wafer manufacturers are now offering products with customer-defined cavities etched in the handle wafer, which significantly simplifies the fabrication of MEMS devices such as pressure sensors. This paper presents a novel cavity buried oxide (BOX) SOI substrate (cavity-BOX) that contains a patterned BOX layer. The patterned BOX can form a buried microchannels network, or serve as a stop layer and a buried hard-etch mask, to accurately pattern the device layer while etching it from the backside of the wafer using the cleanroom microfabrication compatible tools and methods. The use of the cavity-BOX as a buried hard-etch mask is demonstrated by applying it for the fabrication of a deep brain stimulation (DBS) demonstrator. The demonstrator consists of a large flexible area and precisely defined 80 µm-thick silicon islands wrapped into a 1.4 mm diameter cylinder. With cavity-BOX, the process of thinning and separating the silicon islands was largely simplified and became more robust. This test case illustrates how cavity-BOX wafers can advance the fabrication of various MEMS devices, especially those with complex geometry and added functionality, by enabling more design freedom and easing the optimization of the fabrication process.

Design, Fabrication, and Characterization of a Micro Vapor-Jet Vacuum Pump

2007 ◽  
Vol 129 (10) ◽  
pp. 1339-1345 ◽  
Author(s):  
Marco Doms ◽  
Jörg Müller
Keyword(s):  
Pressure Sensors ◽  
Plasma Electron ◽  
Mass Spectrometers ◽  
Deep Reactive Ion Etching ◽  
Fully Integrated ◽  
Glass Substrates ◽  
Mems Fabrication ◽  
New Type ◽  
Vacuum Generation

A microelectromechanical system (MEMS) vapor-jet pump for vacuum generation in miniaturized analytical systems, e.g., micro-mass-spectrometers (Wapelhorst, E., Hauschild, J., and Mueller, J., 2005, “A Fully Integrated Micro Mass Spectrometer,” in Fifth Workshop on Harsh-Environment Mass Spectrometry;Hauschild, J., Wapelhorst, E., and Mueller, J., 2005, “A Fully Integrated Plasma Electron Source for Micro Mass Spectrometers,” in Ninth International Conference on Miniaturized Systems for Chemistry and Life Sciences (μTAS), pp. 476–478), is presented. A high velocity nitrogen or water vapor jet is used for vacuum generation. Starting from atmospheric pressure, a high throughput of more than 23ml∕min and an ultimate pressure of 495mbars were obtained with this new type of micropump. An approach for the full integration of all components of the pump is presented and validated by experimental results. The pump is fabricated from silicon and glass substrates using standard MEMS fabrication techniques including deep reactive ion etching, trichlorosilane molecular vapor deposition, and metal-assisted chemical etching for porous silicon fabrication. Micromachined pressure sensors based on the Pirani principle have been developed and integrated into the pump for monitoring.

Robust thermal microstructure for designing flow sensors and pressure sensors

2017 ◽  
Author(s):  
C. Ghouila-Houri ◽  
R. Viard ◽  
Q. Gallas ◽  
E. Garnier ◽  
A. Merlen ◽  
...  
Keyword(s):  
Pressure Sensors ◽  
Flow Sensors

Design, Fabrication and Characterization of a Fully Integrated Micro Vapor-Jet Vacuum Pump

2006 ◽  
Author(s):  
Marco Doms ◽  
Jo¨rg Mu¨ller
Keyword(s):  
Atmospheric Pressure ◽  
Pressure Sensors ◽  
Absolute Pressure ◽  
Mass Spectrometers ◽  
Fully Integrated ◽  
Glass Substrates ◽  
Mems Fabrication ◽  
New Type ◽  
Vacuum Generation

A MEMS vapor-jet pump for vacuum generation in miniaturized analytical systems, e.g. micro mass-spectrometers [1, 2], is presented. A high velocity gas- or vapor-jet is used for vacuum generation. Starting from atmospheric pressure, a high throughput of more than 23 ml/min and an absolute pressure of 495 mbar were obtained with this new type of micropump. An approach for the full integration of all components of the pump is presented, validated by experimental results. The pump is fabricated from silicon and glass substrates using standard MEMS fabrication techniques including DRIE, trichlorosilane MVD and metal-assisted chemical etching for porous silicon fabrication. Micromachined pressure sensors based on the Pirani principle have been developed and integrated into the pump for monitoring.

Embedded Seal Cavity Fabricated in HTCC MEMS Technology

2014 ◽  
Vol 609-610 ◽  
pp. 461-467
Author(s):  
Chen Li ◽  
Qiu Lin Tan ◽  
Ji Jun Xiong ◽  
Wen Dong Zhang ◽  
Zhong Ren ◽  
...  
Keyword(s):  
High Temperature ◽  
Structural Integrity ◽  
Pressure Sensors ◽  
Sintering Process ◽  
Flow Sensors ◽  
Manufacturing Method ◽  
Cavity Structure ◽  
Mems Technology ◽  
Capacitance Pressure ◽  
Air Tightness

This article presents a design and fabrication method of a embedded cavity using alumina casting-belt. This method is based on HTCC (high-temperature co-fired ceramic) MEMS technology with using fugitive materials. The test structures are fabricated using two different fugitive materialsPolyimide film and ESL4900 film and two different lamination pressures (15MPa and 21MPa). The final stack was sintered by selecting different temperature process parameters in the high-temperature sintering process. Complete the analysis of the sample cavity structure using a SEM (scanning electron microscope). The manufacturing method is available for structural integrity and good air tightness of ceramics sealed cavity and it will be applied to the fabrication of flow sensors, capacitance pressure sensors etc.

Structured methods for improving flow measurement accuracy in pipelines

2020 ◽  
pp. 30-35
Author(s):  
Gurami N. Akhobadze
Keyword(s):  
Flow Measurement ◽  
Measurement Accuracy ◽  
Directional Coupler ◽  
Signal To Noise Ratio ◽  
Scattered Wave ◽  
Orthogonal Polarization ◽  
Flow Sensors ◽  
Information Signal ◽  
Mass Flows ◽  
Processing Device

In the age of digital transformation of production processes in industry and science the development and design of intelligent flow sensors for granular and liquid substances transferring through pipelines becomes more important. With this in view new approaches for improving the accuracy of microwave flowmeters are proposed. Taking into account the characteristics ofelectromagnetic waves propagating through a pipeline, a wave scattered by inhomogeneities of the controlled medium is analyzed. Features of the transformation of the polarized scattered wave limiting the geometric dimensions of the pipeline and optimizing the values of the useful scattered signal are revealed. Expediency of collection of the information signal with orthogonal polarization of the scattered wave and through a directional coupler is substantiated. The method of estimating the measurement accuracy with reference to the signal-to-noise ratio at the input of the processing device is given. The research results can be used in cryogenic machine engineering to measure volume and mass flows of liquid cryogenic products.

PROPAGATION OF THE BURNING WAVE IN A PULSED DETONATION COMBUSTOR OPERATING ON MIXTURES OF HEPTANE AND JET A-1 WITH AIR AND OXYGEN AT [O2/AIR] < 1

2020 ◽  
Author(s):  
M. S. ASSAD ◽  
◽  
O. G. PENYAZKOV ◽  
I. I. CHERNUHO ◽  
K. ALHUSSAN ◽  
...  
Keyword(s):  
Wave Propagation ◽  
Combustion Wave ◽  
Equivalence Ratio ◽  
Pressure Sensors ◽  
Jet Fuel ◽  
Propagation Time ◽  
Burning Wave ◽  
Pulsed Detonation ◽  
Combustion Wave Propagation ◽  
Fuel Jet

This work is devoted to the study of the dynamics of combustion wave propagation in oxygen-enriched mixtures of n-heptane with air and jet fuel "Jet A-1" in a small-size pulsed detonation combustor (PDC) with a diameter of 20 mm and a length less than 1 m. Experiments are carried out after the PDC reaches a stationary thermal regime when changing the equivalence ratio (ϕ = 0.73-1.89) and the oxygen-to-air ratio ([O2/air] = 0.15-0.60). The velocity of the combustion wave is determined by measuring the propagation time of the flame front between adjacent pressure sensors that form measurement segements along the PDC.

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