scholarly journals A Fast Readout Electronic System for Accurate Spatial Detection in Ion Beam Tracking for the Next Generation of Particle Accelerators

2015 ◽  
Vol 64 (2) ◽  
pp. 318-327 ◽  
Author(s):  
Alejandro Garzon-Camacho ◽  
Begona Fernandez ◽  
Marcos A. G. Alvarez ◽  
Joaquin Ceballos ◽  
Jos M. de la Rosa
Keyword(s):  
Ion Beam ◽  
Electronic System ◽  
Particle Accelerators ◽  
Next Generation ◽  
Readout Electronic ◽  
Beam Tracking ◽  
Spatial Detection

Heteroepitaxial diamond detectors for heavy ion beam tracking

2006 ◽  
Vol 15 (4-8) ◽  
pp. 807-810 ◽  
Author(s):  
A. Stolz ◽  
M. Behravan ◽  
M. Regmi ◽  
B. Golding
Keyword(s):  
Ion Beam ◽  
Heavy Ion ◽  
Heavy Ion Beam ◽  
Beam Tracking

scholarly journals ION BEAM MATERIALS ANALYSIS AND MODIFICATIONS AT keV TO MeV ENERGIES AT THE UNIVERSITY OF NORTH TEXAS

2014 ◽  
Vol 27 ◽  
pp. 1460147 ◽  
Author(s):  
BIBHUDUTTA ROUT ◽  
MANGAL S. DHOUBHADEL ◽  
PRAKASH R. POUDEL ◽  
VENKATA C. KUMMARI ◽  
WICKRAMAARACHCHIGE J. LAKSHANTHA ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Nuclear Physics ◽  
Ion Beam ◽  
High Energy ◽  
Particle Accelerators ◽  
Educational Training ◽  
North Texas ◽  
University Of North Texas ◽  
Ion Beam Lithography ◽  
The University

The University of North Texas (UNT) Ion Beam Modification and Analysis Laboratory (IBMAL) has four particle accelerators including a National Electrostatics Corporation (NEC) 9SDH-2 3 MV tandem Pelletron, a NEC 9SH 3 MV single-ended Pelletron, and a 200 kV Cockcroft-Walton. A fourth HVEC AK 2.5 MV Van de Graaff accelerator is presently being refurbished as an educational training facility. These accelerators can produce and accelerate almost any ion in the periodic table at energies from a few keV to tens of MeV. They are used to modify materials by ion implantation and to analyze materials by numerous atomic and nuclear physics techniques. The NEC 9SH accelerator was recently installed in the IBMAL and subsequently upgraded with the addition of a capacitive-liner and terminal potential stabilization system to reduce ion energy spread and therefore improve spatial resolution of the probing ion beam to hundreds of nanometers. Research involves materials modification and synthesis by ion implantation for photonic, electronic, and magnetic applications, micro-fabrication by high energy (MeV) ion beam lithography, microanalysis of biomedical and semiconductor materials, development of highenergy ion nanoprobe focusing systems, and educational and outreach activities. An overview of the IBMAL facilities and some of the current research projects are discussed.

In-Plane Gravity Loading of a Circular Membrane

2000 ◽  
Vol 67 (4) ◽  
pp. 837-839 ◽  
Author(s):  
R. O. Tejeda ◽  
E. G. Lovell ◽  
R. L. Engelstad
Keyword(s):  
Displacement Field ◽  
Ion Beam ◽  
Stress And Strain ◽  
Circular Membrane ◽  
Next Generation ◽  
Projection Lithography ◽  
Beam Projection ◽  
Lithographic Masks

This paper develops the displacement field for a circular membrane which is statically loaded by gravity acting in its plane. Coupled to the displacements are the stress and strain distributions. The solution is applicable to the modeling of next generation lithographic masks, ion-beam projection lithography masks in particular. [S0021-8936(00)00803-5]

WE-G-213CD-01: 4D Optimization for Scanned Ion Beam Tracking Therapy for Moving Tumors

2012 ◽  
Vol 39 (6Part28) ◽  
pp. 3970-3970 ◽  
Author(s):  
J Eley ◽  
C Graeff ◽  
R Lüchtenborg ◽  
M Durante ◽  
R Howell ◽  
...  
Keyword(s):  
Ion Beam ◽  
Beam Tracking

High Resolution Resists for Next Generation Lithography: The Nanocomposite Approach

2000 ◽  
Vol 636 ◽  
Author(s):  
Kenneth E. Gonsalves ◽  
Hengpeng Wu ◽  
Yongqi Hu ◽  
Lhadi Merhari
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Ion Beam ◽  
Proximity Effects ◽  
Next Generation ◽  
Polyhedral Oligosilsesquioxane ◽  
Ion Beam Lithography ◽  
New Class ◽  
Next Generation Lithography

AbstractThe SIA roadmap predicts mass production of sub-100 nm resolution circuits by 2006. This not only imposes major constraints on next generation lithographic tools but also requires that new resists capable of accommodating such a high resolution be synthesized and developed concurrently. Except for ion beam lithography, DUV, X-ray, and in particular electron beam lithography suffer significantly from proximity effects, leading to severe degradation of resolution in classical resists. We report a new class of resists based on organic/inorganic nanocomposites having a structure that reduces the proximity effects. Synthetic routes are described for a ZEP520®nano-SiO2 resist where 47nm wide lines have been written with a 40 nm diameter, 20 keV electron beam at no sensitivity cost. Other resist systems based on polyhedral oligosilsesquioxane copolymerized with MMA, TBMA, MMA and a proprietary PAG are also presented. These nanocomposite resists suitable for DUV and electron beam lithography show enhancement in both contrast and RIE resistance in oxygen. Tentative mechanisms responsible for proximity effect reduction are also discussed.

scholarly journals Fission Products Distribution in TRISO Coated Fuel Particles Irradiated to 3.22 X 1021 n/cm2 Fast Fluence at 1092°C

2015 ◽  
Author(s):  
Haiming Wen ◽  
Isabella J. Van Rooyen ◽  
Connie M. Hill ◽  
Tammy L. Trowbridge ◽  
Ben D. Coryell
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Ion Beam ◽  
Fission Products ◽  
Fuel Particle ◽  
Next Generation ◽  
Research Activities ◽  
Transmission Electron ◽  
Fuel Particles ◽  
Coated Fuel Particle

Mechanisms by which fission products (especially silver [Ag]) migrate across the coating layers of tristructural isotropic (TRISO) coated fuel particles designed for next generation nuclear reactors have been the subject of a variety of research activities due to the complex nature of the migration mechanisms. This paper presents results obtained from the electron microscopic examination of selected irradiated TRISO coated particles from fuel compact 1-3-1 irradiated in the first Advanced Gas Reactor experiment (AGR-1) that was performed as part of the Next Generation Nuclear Plant (NGNP) project. It is of specific interest to study particles of this compact as they were fabricated using a different carrier gas composition ratio for the SiC layer deposition compared with the baseline coated fuel particles reported on previously. Basic scanning electron microscopy (SEM) and SEM montage investigations of the particles indicate a correlation between the distribution of fission product precipitates and the proximity of the inner pyrolytic carbon (IPyC)-silicon carbide (SiC) interface to the fuel kernel. Transmission electron microscopy (TEM) samples were sectioned by focused ion beam (FIB) technique from the IPyC layer, the SiC layer and the IPyC-SiC interlayer of the coated fuel particle. Detailed TEM and scanning transmission electron microscopy (STEM) coupled with energy dispersive X-ray spectroscopy (EDS) were performed to identify fission products and characterize their distribution across the IPyC and SiC layers in the areas examined. Results indicate the presence of palladium-silicon-uranium (Pd-Si-U), Pd-Si, Pd-U, Pd, U, U-Si precipitates in the SiC layer and the presence of Pd-Si-U, Pd-Si, U-Si, U precipitates in the IPyC layer. No Ag-containing precipitates are evident in the IPyC or SiC layers. With increased distance from the IPyC-SiC interface, there are less U-containing precipitates, however, such precipitates are present across nearly the entire SiC layer.

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