Investigation of Self-Heating Effects in Gate-All-Around MOSFETs With Vertically Stacked Multiple Silicon Nanowire Channels

2017 ◽  
Vol 64 (11) ◽  
pp. 4393-4399 ◽  
Author(s):  
Jun-Young Park ◽  
Byung-Hyun Lee ◽  
Ki Soo Chang ◽  
Dong Uk Kim ◽  
Chanbae Jeong ◽  
...  
2014 ◽  
Vol 2014 ◽  
pp. 1-7 ◽  
Author(s):  
P. Anandan ◽  
N. Malathi ◽  
N. Mohankumar

Silicon nanowires are leading the CMOS era towards the downsizing limit and its nature will be effectively suppress the short channel effects. Accurate modeling of thermal noise in nanowires is crucial for RF applications of nano-CMOS emerging technologies. In this work, a perfect temperature-dependent model for silicon nanowires including the self-heating effects has been derived and its effects on device parameters have been observed. The power spectral density as a function of thermal resistance shows significant improvement as the channel length decreases. The effects of thermal noise including self-heating of the device are explored. Moreover, significant reduction in noise with respect to channel thermal resistance, gate length, and biasing is analyzed.


2012 ◽  
Vol 11 (1) ◽  
pp. 106-117 ◽  
Author(s):  
K. Raleva ◽  
D. Vasileska ◽  
A. Hossain ◽  
S.-K. Yoo ◽  
S. M. Goodnick
Keyword(s):  

1995 ◽  
Vol 10 (4) ◽  
pp. 515-522 ◽  
Author(s):  
M De Murcia ◽  
E Richard ◽  
J M Perraudin ◽  
A Boyer ◽  
A Benvenuti ◽  
...  

2017 ◽  
Vol 137 ◽  
pp. 123-127
Author(s):  
Ilho Myeong ◽  
Dokyun Son ◽  
Hyunsuk Kim ◽  
Myounggon Kang ◽  
Hyungcheol Shin

2015 ◽  
Vol 5 (1) ◽  
Author(s):  
R. A. Sporea ◽  
T. Burridge ◽  
S. R. P. Silva
Keyword(s):  

1995 ◽  
Vol 379 ◽  
Author(s):  
Jeffrey J. Welser

ABSTRACTThe experimental application of strained-Si / relaxed-Si1−xGex heterostructures to n-MOSFETs is discussed, focusing on the enhanced mobility provided by the strain. This paper provides an overview of the theoretically-predicted electronic properties of these heterostructures, as well as their growth. Several practical issues which arise in MOS applications are covered, including the effect of the relaxed-Si1−xGex, buffer layers on diode performance, and the observation of self-heating effects in the output characteristics of the MOS transistors.


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