Improvement of Impact Ionization Effect and Subthreshold Current in InAlAs/InGaAs Metal–Oxide–Semiconductor Metamorphic HEMT With a Liquid-Phase Oxidized InAlAs as Gate Insulator
2007 ◽
Vol 54
(3)
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pp. 418-424
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2012 ◽
Vol 59
(1)
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pp. 121-127
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2005 ◽
Vol 26
(12)
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pp. 864-866
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2005 ◽
Vol 119
(1)
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pp. 36-40
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