Improvement of Impact Ionization Effect and Subthreshold Current in InAlAs/InGaAs Metal–Oxide–Semiconductor Metamorphic HEMT With a Liquid-Phase Oxidized InAlAs as Gate Insulator

2007 ◽  
Vol 54 (3) ◽  
pp. 418-424 ◽  
Author(s):  
Kuan-Wei Lee ◽  
Kai-Lin Lee ◽  
Xian-Zheng Lin ◽  
Chao-Hsien Tu ◽  
Yeong-Her Wang
Author(s):  
Dong Gun Kim ◽  
Cheol Hyun An ◽  
Sanghyeon Kim ◽  
Dae Seon Kwon ◽  
Junil Lim ◽  
...  

Atomic layer deposited TiO2- and Al2O3-based high-k gate insulator (GI) were examined for the Ge-based metal-oxide-semiconductor capacitor application. The single-layer TiO2 film showed a too high leakage current to be...


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