AlGaN/GaN Metal–Oxide–Semiconductor High-Electron Mobility Transistor With Liquid-Phase-Deposited Barium-Doped $\hbox{TiO}_{2}$ as a Gate Dielectric
2012 ◽
Vol 59
(1)
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pp. 121-127
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2005 ◽
Vol 26
(12)
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pp. 864-866
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2010 ◽
Vol 157
(10)
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pp. H947
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2005 ◽
Vol 49
(2)
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pp. 213-217
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2005 ◽
Vol 23
(5)
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pp. 1943
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2015 ◽
Vol 36
(12)
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pp. 1287-1290
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2012 ◽
Vol 33
(7)
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pp. 997-999
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