AlGaN/GaN Metal–Oxide–Semiconductor High-Electron Mobility Transistor With Liquid-Phase-Deposited Barium-Doped $\hbox{TiO}_{2}$ as a Gate Dielectric

2012 ◽  
Vol 59 (1) ◽  
pp. 121-127 ◽  
Author(s):  
Chih-Chun Hu ◽  
Mon-Sen Lin ◽  
Tsu-Yi Wu ◽  
Feri Adriyanto ◽  
Po-Wen Sze ◽  
...  
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