scholarly journals Thermal stability of electrical characteristics of nickel silicide metal gate

2007 ◽  
Vol 56 (8) ◽  
pp. 4943
Author(s):  
Shan Xiao-Nan ◽  
Huang Ru ◽  
Li Yan ◽  
Cai Yi-Mao
Keyword(s):  
Thermal Stability ◽  
Nickel Silicide ◽  
Electrical Characteristics ◽  
Metal Gate ◽  
Thermal Stability Of

Electrical Characteristics and Thermal Stability of $ \hbox{Hf}_{x}\hbox{Ta}_{y}\hbox{Si}_{z}\hbox{N}$ Metal Gate Electrode for Advanced MOS Devices

2008 ◽  
Vol 55 (11) ◽  
pp. 3259-3266
Author(s):  
Chang-Ta Yang ◽  
Kuei-Shu Chang-Liao ◽  
Hsin-Chun Chang ◽  
Chung-Hao Fu ◽  
Tien-Ko Wang ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Electrical Characteristics ◽  
Gate Electrode ◽  
Metal Gate ◽  
Mos Devices ◽  
Thermal Stability Of

The improvement of thermal stability of nickel silicide by adding a thin Zr interlayer

2006 ◽  
Vol 83 (2) ◽  
pp. 345-350 ◽  
Author(s):  
Wei Huang ◽  
Li-Chun Zhang ◽  
Yu-Zhi Gao ◽  
Han-Yan Jin
Keyword(s):  
Thermal Stability ◽  
Nickel Silicide ◽  
Thermal Stability Of

Thermal stability of nickel-cobalt multilayer silicide

2005 ◽  
Vol 891 ◽  
Author(s):  
Kil Jin Han ◽  
Yu Jung Cho ◽  
Soon Young Oh ◽  
Yong Jin Kim ◽  
Won Jae Lee ◽  
...  
Keyword(s):  
Thermal Stability ◽  
High Temperature ◽  
Depth Profile ◽  
Ternary Phase ◽  
Nickel Silicide ◽  
Composition Gradient ◽  
Cobalt Silicide ◽  
Nickel Cobalt ◽  
Thermal Stability Of ◽  
Xps Depth Profile

ABSTRACTIn this study, we have investigated the structure of nickel-cobalt silicide to understand its behavior at high temperature. Nickel-cobalt silicide was formed after two-step RTP at 500°C and 700°C respectively. We could observe by TEM that nickel-cobalt silicide consists of a structure which seems to be a Ni-Co-Si ternary phase. No nickel silicide phases and cobalt silicide phases were detected in nickel-cobalt silicide by XRD. From XPS depth profile, we could confirm that there is a cobalt composition gradient along the silicide.

Work function and thermal stability of Ti1−xAlxNy for dual metal gate electrodes

2002 ◽  
Vol 81 (22) ◽  
pp. 4192-4194 ◽  
Author(s):  
Tae-Ho Cha ◽  
Dae-Gyu Park ◽  
Tae-Kyun Kim ◽  
Se-Aug Jang ◽  
In-Seok Yeo ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Work Function ◽  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Gate Electrodes ◽  
Dual Metal ◽  
Thermal Stability Of

Thermal stability of Hf/sub x/Ta/sub y/N metal gate electrodes for advanced MOS devices

2006 ◽  
Vol 27 (3) ◽  
pp. 148-150 ◽  
Author(s):  
Chin-Lung Cheng ◽  
Kuei-Shu Chang-Liao ◽  
Tzu-Chen Wang ◽  
Tien-Ko Wang ◽  
Howard Chih-Hao Wang
Keyword(s):  
Thermal Stability ◽  
Metal Gate Electrodes ◽  
Metal Gate ◽  
Gate Electrodes ◽  
Mos Devices ◽  
Thermal Stability Of

Effects of Mg on the electrical characteristics and thermal stability of MgxZn1−xO thin film transistors

2011 ◽  
Vol 98 (12) ◽  
pp. 123511 ◽  
Author(s):  
Chieh-Jen Ku ◽  
Ziqing Duan ◽  
Pavel I. Reyes ◽  
Yicheng Lu ◽  
Yi Xu ◽  
...  
Keyword(s):  
Thin Film ◽  
Thermal Stability ◽  
Thin Film Transistors ◽  
Electrical Characteristics ◽  
Thermal Stability Of
Sign in / Sign up

Export Citation Format

Share Document