Impact of nano-scale through-silicon vias on the quality of today and future 3D IC designs

Author(s):  
Dae Hyun Kim ◽  
Suyoun Kim ◽  
Sung Kyu Lim
2011 ◽  
Vol 2011 (1) ◽  
pp. 000001-000007
Author(s):  
Chien-Ying Wu ◽  
Shang-Chun Chen ◽  
Pei-Jer Tzeng ◽  
John H. Lau ◽  
Yi-Feng Hsu ◽  
...  

In this study, key enabling technologies such as the oxide liner by the PECVD, the barrier and seed layers by the PVD, and Cu-plating of blind TSVs on 300mm wafers for 3D integration are investigated. Emphases are placed on the determination and optimization of the important parameters for each of the key enabling technologies. Also, leakage currents of the fabricated Cu-filled TSVs are measured. Furthermore cross sections and SEM of the fabricated TSVs are provided and examined.


2012 ◽  
Vol 2012 (1) ◽  
pp. 000548-000553 ◽  
Author(s):  
Fuliang Le ◽  
S. W. Ricky Lee ◽  
Jingshen Wu ◽  
Matthew M. F. Yuen

In this paper, a 3D stacked-die package is developed for the miniaturization and integration of electronic devices. The developed package has a stacked flip-chip-on-chip structure and eight flip chips are arranged in four vertical layers using four silicon chip carriers with through silicon vias (TSVs). In each layer, two flip chips are mounted on the silicon chip carrier with 100 um solder bumps, and multiple TSVs are fabricated in each silicon chip carrier for underfill dispensing purpose. The 3D module with four stacked layers is sequentially assembled by the standard surface mount reflow process and finally mounted to a substrate. In the underfill process, conventional I-pass underfill is used to fill up the gaps of the bottom two layers as it has relatively fast spreading speed. For the top two chip carriers, underfill is dispensed through TSVs to fill the gaps. Unlike the conventional underfill process, the encapsulant in this case would not flow in the gaps by the capillary effect unless the dispensed materials can obtain enough kinetic energy to overcome the surface tension at the end of TSVs, and thus, smooth sidewall, proper dispensing settings and optimized TSV pattern are needed. After underfill, detailed inspections are performed to verify the quality of encapsulation. The results show that the combined I-pass/TSV underfill process gives void-free encapsulation and perfect fillets for the stacked 3D package.


Author(s):  
C. W. Luo ◽  
Y. C. Wu ◽  
J. Y. Wang ◽  
S. S. H. Hsu

Materials ◽  
2019 ◽  
Vol 12 (22) ◽  
pp. 3713 ◽  
Author(s):  
Fei Zhao

The high reliability of electroplating through silicon vias (TSVs) is an attractive hotspot in the application of high-density integrated circuit packaging. In this paper, improvements for fully filled TSVs by optimizing sputtering and electroplating conditions were introduced. Particular attention was paid to the samples with different seed layer structures. These samples were fabricated by different sputtering and treatment approaches, and accompanied with various electroplating profile adjustments. The images were observed and characterized by X-ray equipment and a scanning electron microscope (SEM). The results show that optimized sputtering and electroplating conditions can help improve the quality of TSVs, which could be interpreted as the interface effect of the TSV structure.


2012 ◽  
Vol 2012 (1) ◽  
pp. 000239-000243
Author(s):  
Srinidhi Raghavan Narasimhan ◽  
A. Ege Engin

The 3D IC integration technology and silicon interposers rely on through silicon vias (TSVs) for vertical interconnections. Hence, the medium carrying high frequency signals is lossy silicon (Si). Fundamental understanding of wave propagation through TSVs is essential for successful implementation of 3D IC integration technology as well as for the development of Si interposers at RF/microwave frequencies. The focus of this paper is characterization and modelling of TSVs and Si to explore high speed signal propagation through the lossy Si medium. To understand better the physical significance of the TSV, we will establish a framework for wave propagation through TSVs based on dielectric quasi-TEM, skin effect, and slow-wave modes similar to MIS micro-strip lines. For validation of the existence of these modes, full wave simulation results will be compared with simpler two dimensional transmission line simulators.


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