Comparison between millimeter wave interferometry and Langmuir probe measurements in low pressure discharges

2003 ◽  
Author(s):  
R.C. Garner ◽  
R.B. Piejak
Keyword(s):  
Millimeter Wave ◽  
Langmuir Probe ◽  
Low Pressure ◽  
Langmuir Probe Measurements ◽  
Probe Measurements

Effect of RF or VHF Plasma on Nanocrystalline Silicon Thin Film Structure: Insight from OES and Langmuir Probe Measurements

2013 ◽  
Vol 1536 ◽  
pp. 161-166
Author(s):  
Lala Zhu ◽  
Ujjwal K Das ◽  
Steven S Hegedus ◽  
Robert W Birkmire
Keyword(s):  
Grain Size ◽  
Langmuir Probe ◽  
Volume Fraction ◽  
Nanocrystalline Silicon ◽  
Low Pressure ◽  
High Energy ◽  
Rf Plasma ◽  
Crystalline Volume Fraction ◽  
Langmuir Probe Measurements ◽  
Probe Measurements

ABSTRACTOptical emission spectroscopy (OES) and Langmuir Probe were used to characterize RF and VHF plasma properties under conditions leading to nanocrystalline silicon film deposition. Films deposited by RF plasma at low pressure (3 Torr), even with high crystalline volume fraction, show weak X-ray diffraction signals, suggesting small grain size, while RF films at higher pressure (8 Torr) and VHF films at both high and low pressure have larger grain sizes. The preferential growth orientation is controlled by the H2/SiH4 ratio with RF plasma, while the film deposited by VHF shows primarily (220) orientation independent of H-dilution ratio. Langmuir Probe measurements indicate that the high energy electron population is reduced by increasing pressure from 3 Torr to 8 Torr in RF plasma. Compared with RF plasma, the VHF plasma shows higher electron density and sheath potential, but lower average electron energy, which may be responsible for the larger grain size and crystal orientation. The growth rate and crystalline volume fraction of the film is correlated with OES intensity ratio of SiH* and Hα/SiH* for both RF and VHF plasmas.

Comments on the Langmuir probe measurements of radio-frequency capacitive argon–hydrogen mixture discharge at low pressure

2018 ◽  
Vol 96 (5) ◽  
pp. 494-500 ◽  
Author(s):  
Murat Tanışlı ◽  
Nesli̇han Şahi̇n ◽  
Süleyman Demi̇r
Keyword(s):  
Radio Frequency ◽  
Electron Density ◽  
Langmuir Probe ◽  
Low Pressure ◽  
Hydrogen Gas ◽  
Floating Potential ◽  
Rf Power ◽  
Measurement Results ◽  
Langmuir Probe Measurements ◽  
Probe Measurements

In this paper, the current–voltage graphs of discharge in the chamber of capacitive coupled radio frequency (CCRF) at low pressure were presented for Langmuir probe. The Langmuir probe measurements for estimating the electron density and temperature in capacitive coupled discharges at low pressures were presented and the electron temperatures of the Ar–H2 mixture discharge generated at different conditions were reported using the Langmuir probe. The focus of this study is that the CCRF discharge can be determined and explained using the characteristics of plasma by means of Langmuir probe measurements for the different hydrogen rates in Ar–H2 mixture discharge. The measurement results of Langmuir probe gave values around 1015 m−3 for the electron density. The floating potential depended on the electronegative gas amount. It was found that the increase of hydrogen gas amount in the mixture discharge caused the decrease of the floating potential. Also, a decrease in the argon (Ar) metastable with the increase in hydrogen (H2) content was obtained. When the applied radio frequency (RF) power was increased, the thickness and collisionless sheath occurring at lower RF power could transform to thin sheath.

Langmuir Probe Measurements in the WEGA Stellarator

2004 ◽  
Vol 44 (7-8) ◽  
pp. 650-655 ◽  
Author(s):  
K. Horvath ◽  
J. Lingertat ◽  
M. Laux ◽  
F. Wagner
Keyword(s):  
Langmuir Probe ◽  
Langmuir Probe Measurements ◽  
Probe Measurements

Langmuir probe measurements aboard the International Space Station

2016 ◽  
Vol 56 (8) ◽  
pp. 1082-1089 ◽  
Author(s):  
B. Kirov ◽  
S. Asenovski ◽  
D. Bachvarov ◽  
A. Boneva ◽  
V. Grushin ◽  
...  
Keyword(s):  
International Space Station ◽  
Langmuir Probe ◽  
Space Station ◽  
International Space ◽  
Langmuir Probe Measurements ◽  
Probe Measurements

Langmuir probe measurements in commercial plasma plants

1994 ◽  
Vol 3 (4) ◽  
pp. 539-544 ◽  
Author(s):  
A Brockhaus ◽  
C Borchardt ◽  
J Engemann
Keyword(s):  
Langmuir Probe ◽  
Langmuir Probe Measurements ◽  
Probe Measurements
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