ScN/sub x/ gate on atomic layer deposited HfO/sub 2/ and effect of high-pressure wet post deposition annealing

2006 ◽  
Vol 27 (6) ◽  
pp. 435-438 ◽  
Author(s):  
Hyundoek Yang ◽  
Dongsoo Lee ◽  
M.S. Rahman ◽  
M. Hasan ◽  
Hyung-Seok Jung ◽  
...  
Keyword(s):  
High Pressure ◽  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Post Deposition

Effects of Post-Deposition Annealing on the Electrical Properties of HfSiO Films Grown by Atomic Layer Deposition

2005 ◽  
Vol 44 (4B) ◽  
pp. 2230-2234 ◽  
Author(s):  
Hag-Ju Cho ◽  
Hye Lan Lee ◽  
Hong Bae Park ◽  
Taek Soo Jeon ◽  
Seong Geon Park ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Layer Deposition ◽  
Post Deposition

Electrical Characteristics of LaAlO[sub 3] Gate Dielectrics Prepared by High-Pressure Hydrogen Post-Deposition Annealing

2006 ◽  
Vol 9 (11) ◽  
pp. F77 ◽  
Author(s):  
Musarrat Hasan ◽  
Min Seok Jo ◽  
Md. Shahriar Rahman ◽  
Hyejong Choi ◽  
Sungho Heo ◽  
...  
Keyword(s):  
High Pressure ◽  
Gate Dielectrics ◽  
Electrical Characteristics ◽  
Post Deposition Annealing ◽  
Post Deposition ◽  
Pressure Hydrogen

Stabilization of a very high-k crystalline ZrO2 phase by post deposition annealing of atomic layer deposited ZrO2/La2O3 dielectrics on germanium

2010 ◽  
Vol 256 (16) ◽  
pp. 5031-5034 ◽  
Author(s):  
S. Abermann ◽  
C. Henkel ◽  
O. Bethge ◽  
G. Pozzovivo ◽  
P. Klang ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Zro2 Phase ◽  
High K ◽  
Very High ◽  
Post Deposition

Atomic layer deposition and post-deposition annealing of PbTiO3 thin films

2006 ◽  
Vol 496 (2) ◽  
pp. 346-352 ◽  
Author(s):  
Jenni Harjuoja ◽  
Anne Kosola ◽  
Matti Putkonen ◽  
Lauri Niinistö
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Layer Deposition ◽  
Post Deposition

Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing

RSC Advances ◽  
2016 ◽  
Vol 6 (100) ◽  
pp. 98337-98343 ◽  
Author(s):  
Felix Mattelaer ◽  
Tom Bosserez ◽  
Jan Rongé ◽  
Johan A. Martens ◽  
Jolien Dendooven ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Atomic Layer Deposition ◽  
Manganese Oxide ◽  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Solar Hydrogen ◽  
Layer Deposition ◽  
Thin Film Catalysts ◽  
Post Deposition

Manganese oxide thin films were obtained by a combination of atomic layer deposition and post-deposition annealing, and the viability of these thin films as thin film catalysts for solar hydrogen devices has been demonstrated.

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